915 MHz高容量大气等离子体炬的研究

IF 5.3 2区材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS

Surface & Coatings Technology Pub Date : 2011-07-25 DOI:10.1016/j.surfcoat.2011.04.031

J. Kopecki , D. Kiesler , M. Leins , A. Schulz , M. Walker , M. Kaiser , H. Muegge , U. Stroth

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引用次数: 6

摘要

研制了频率为915 MHz的常压微波等离子体火炬。该开发伴随着CST Microwave Studio®程序对等离子体装置中的电磁场分布进行模拟。利用发射光谱(OES)测定等离子体的气体温度。氩/氢等离子体的测量温度高达7000 K，足以使所有材料蒸发。作为一种应用，我们使用等离子炬进行硅粉的反应蒸发，并随后沉积不同形貌的硅涂层，主要是通过扫描电子显微镜进行研究。

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Investigations of a high volume atmospheric plasma torch at 915 MHz

An atmospheric pressure microwave plasma torch at a frequency of 915 MHz was developed and investigated. The development was accompanied by simulations of the electromagnetic field distribution in the plasma device with the programme CST Microwave Studio®. Optical emission spectroscopy (OES) was carried out in order to determine the gas temperature of the plasma. The measured temperature of an argon/hydrogen-plasma was up to 7000 K which is high enough to evaporate all materials. As an application we used the plasma torch for reactive evaporation of silicon powder and subsequent deposition of silicon coatings with different morphologies which were investigated mainly by scanning electron microscopy.

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来源期刊

Surface & Coatings Technology 工程技术-材料科学：膜

CiteScore

10.00

自引率

11.10%

发文量

921

审稿时长

19 days

期刊介绍： Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.