等离子体增强化学气相沉积聚(2,2,3,4,4,4-六氟丙烯酸丁酯)薄膜†

Chemical Vapor Deposition Pub Date : 2015-09-23 DOI:10.1002/cvde.201507168

Mustafa Karaman, Ezgi Yenice

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引用次数: 16

摘要

报道了用等离子体增强化学气相沉积(PECVD)法制备聚(2,2,3,4,4,4-六氟丙烯酸丁酯)(PHFBA)薄膜。PHFBA是一种无毒的低表面能聚合物，含有-CF3端基，这使得PHFBA成为一种合适的疏水整理剂。研究了等离子体功率和衬底温度对沉积薄膜化学和形态结构的影响。发现在低功率和高温下进行的沉积具有更大的全氟烷基功能保留。当PHFBA薄膜沉积在水接触角大于150度的粗糙纤维垫表面时，表现出超疏水性。

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Plasma Enhanced Chemical Vapor Deposition of Poly(2,2,3,4,4,4-hexafluorobutyl acrylate) Thin Films†

The synthesis of poly(2,2,3,4,4,4-hexafluorobutyl acrylate) (PHFBA) thin films using plasma enhanced chemical vapor deposition (PECVD) method is reported. PHFBA is a non-toxic and low surface energy polymer containing a –CF₃ end group, which makes PHFBA a suitable hydrophobic finish. The effects of plasma power and substrate temperature on chemical and morphological structure of as-deposited films are studied. A greater retention of the perfluoroalkyl functionality is found for the depositions carried out at low powers and high temperatures. PHFBA thin films show superhydrophobic properties when deposited on rough fiber mat surfaces with observed water contact angles greater than 150 degrees.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.