Siti Hajar Othman, Suraya Abdul Rashid, Tinia Idaty Mohd. Ghazi, Norhafizah Abdullah
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3D CFD Simulations: Effect of Operation Parameters on the Deposition of Photocatalytic TiO2 Nanoparticles by MOCVD
A 3-dimensional (3D) computational fluid dynamics (CFD) simulation study on the effect of temperature and carrier-gas flow rate on the deposition of photocatalytic titanium dioxide (TiO2) nanoparticles by metal-organic (MO)CVD is presented. The model predicts the temperature, velocity, mass fraction of reactants and products, kinetic rate of reaction, and surface deposition rate profiles. Increasing temperature and reducing carrier gas flow rate increases the deposition rate and hence the amount of nanoparticles produced. Unlike carrier-gas flow rate, temperature is significant in determining the rate of surface deposition. Simulation results are validated by experiments whenever possible due to limited data. Decent agreement between experiment and simulation supports the reliability of the simulation.
期刊介绍：
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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