纳米电子学领域纳米合金的电子束诱导CVD研究

Chemical Vapor Deposition Pub Date : 2014-08-19 DOI:10.1002/cvde.201407119

Mostafa Moonir Shawrav, Domagoj Belić, Marco Gavagnin, Stefan Wachter, Markus Schinnerl, Heinz D. Wanzenboeck, Emmerich Bertagnolli

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引用次数: 16

摘要

在各种多金属组合中，金铁纳米合金被认为是有前景的数据存储材料。本文报道了利用聚焦电子束诱导沉积技术(FEBID)制备Au-Fe纳米合金的首次成功成果，探索了在纳米分辨率下直接写入纳米结构的可能性。将气态有机金属前驱体同时注入沉积室，在同一纳米结构内共沉积铁和金。制备的纳米结构显示出空间上均匀的铁与金的元素比例，可以根据实验条件进行调整。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics†

Among various multi-metal combinations, Au-Fe nanoalloys are envisaged as prospective materials for data storage applications. Here we report on the first successful achievement of Au-Fe nanoalloys using focused electron beam-induced deposition (FEBID), exploiting the possibility of directly writing nanostructures at nanometer resolution. Gaseous organometallic precursors are injected simultaneously into the deposition chamber to co-deposit Fe and Au within the same nanostructure. Fabricated nanostructures show a spatially uniform elemental ratio of iron to gold that can be tailored by experimental conditions.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.