Davide Barreca, Giorgio Carraro, Daniel Peeters, Alberto Gasparotto, Chiara Maccato, Wilhelmus M. M. Kessels, Valentino Longo, Francesca Rossi, Elza Bontempi, Cinzia Sada, Anjana Devi
{"title":"两步CVD/溅射法制备ϵ-Fe2O3纳米棒表面的CuO修饰**","authors":"Davide Barreca, Giorgio Carraro, Daniel Peeters, Alberto Gasparotto, Chiara Maccato, Wilhelmus M. M. Kessels, Valentino Longo, Francesca Rossi, Elza Bontempi, Cinzia Sada, Anjana Devi","doi":"10.1002/cvde.201407108","DOIUrl":null,"url":null,"abstract":"<div>\n \n \n <section>\n \n <p>In this paper we report on the first example of Fe<sub>2</sub>O<sub>3</sub>/CuO composites fabricated by a two-step vapor-phase synthetic strategy. The target route is based on the CVD of Fe<sub>2</sub>O<sub>3</sub> nanorod arrays on Si(100) at 400 °C starting from Fe(hfa)<sub>2</sub>TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = <i>N</i>,<i>N</i>,<i>N</i>′,<i>N</i>′-tetramethylethylenediamine), followed by radio frequency (RF) copper sputtering for various process durations, and final ex-situ annealing in air. The combined use of complementary structural, morphological, and chemical analyses give evidence of the formation of pure nanocomposite systems, characterized by the presence of the sole <i>ϵ</i>-Fe<sub>2</sub>O<sub>3</sub> and CuO phases. The unique features of the adopted approach enable an efficient surface decoration of <i>ϵ</i>-Fe<sub>2</sub>O<sub>3</sub> rods by CuO nanoparticles a few nm in diameter, resulting in an intimate contact between the two oxides, and a CuO content tunable through variations of the sole sputtering time.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"20 7-8-9","pages":"313-319"},"PeriodicalIF":0.0000,"publicationDate":"2014-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407108","citationCount":"11","resultStr":"{\"title\":\"Surface Decoration of ϵ-Fe2O3 Nanorods by CuO Via a Two-Step CVD/Sputtering Approach**\",\"authors\":\"Davide Barreca, Giorgio Carraro, Daniel Peeters, Alberto Gasparotto, Chiara Maccato, Wilhelmus M. M. Kessels, Valentino Longo, Francesca Rossi, Elza Bontempi, Cinzia Sada, Anjana Devi\",\"doi\":\"10.1002/cvde.201407108\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n \\n <section>\\n \\n <p>In this paper we report on the first example of Fe<sub>2</sub>O<sub>3</sub>/CuO composites fabricated by a two-step vapor-phase synthetic strategy. The target route is based on the CVD of Fe<sub>2</sub>O<sub>3</sub> nanorod arrays on Si(100) at 400 °C starting from Fe(hfa)<sub>2</sub>TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = <i>N</i>,<i>N</i>,<i>N</i>′,<i>N</i>′-tetramethylethylenediamine), followed by radio frequency (RF) copper sputtering for various process durations, and final ex-situ annealing in air. The combined use of complementary structural, morphological, and chemical analyses give evidence of the formation of pure nanocomposite systems, characterized by the presence of the sole <i>ϵ</i>-Fe<sub>2</sub>O<sub>3</sub> and CuO phases. The unique features of the adopted approach enable an efficient surface decoration of <i>ϵ</i>-Fe<sub>2</sub>O<sub>3</sub> rods by CuO nanoparticles a few nm in diameter, resulting in an intimate contact between the two oxides, and a CuO content tunable through variations of the sole sputtering time.</p>\\n </section>\\n </div>\",\"PeriodicalId\":10093,\"journal\":{\"name\":\"Chemical Vapor Deposition\",\"volume\":\"20 7-8-9\",\"pages\":\"313-319\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-07-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1002/cvde.201407108\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chemical Vapor Deposition\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201407108\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201407108","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Surface Decoration of ϵ-Fe2O3 Nanorods by CuO Via a Two-Step CVD/Sputtering Approach**
In this paper we report on the first example of Fe2O3/CuO composites fabricated by a two-step vapor-phase synthetic strategy. The target route is based on the CVD of Fe2O3 nanorod arrays on Si(100) at 400 °C starting from Fe(hfa)2TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N′,N′-tetramethylethylenediamine), followed by radio frequency (RF) copper sputtering for various process durations, and final ex-situ annealing in air. The combined use of complementary structural, morphological, and chemical analyses give evidence of the formation of pure nanocomposite systems, characterized by the presence of the sole ϵ-Fe2O3 and CuO phases. The unique features of the adopted approach enable an efficient surface decoration of ϵ-Fe2O3 rods by CuO nanoparticles a few nm in diameter, resulting in an intimate contact between the two oxides, and a CuO content tunable through variations of the sole sputtering time.
期刊介绍:
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.