镍合金的CVD渗铝。HCl流量的影响

Bartek Wierzba, Katarzyna Tkacz-Śmiech, Andrzej Nowotnik, Kamil Dychtoń
{"title":"镍合金的CVD渗铝。HCl流量的影响","authors":"Bartek Wierzba,&nbsp;Katarzyna Tkacz-Śmiech,&nbsp;Andrzej Nowotnik,&nbsp;Kamil Dychtoń","doi":"10.1002/cvde.201307090","DOIUrl":null,"url":null,"abstract":"<div>\n \n <section>\n \n <p>The solid-state diffusion in binary and ternary systems is overall treated and modeled using the bi-velocity method. The mathematical formulation is given, and the boundary conditions discussed. The model allows the calculation of concentration profiles, spatial distribution of the entropy production rate, and diffusion path. The last two can be used to identify the phases present in the diffusion zone of the ternary system, and determine the thicknesses of the respective layers. The model is applied for the first time to simulate diffusion during aluminization of nickel and its super-alloys, MAR-M200 + Hf and CMSX-4, and the predictions are compared with the results of the experiments performed by the authors. The results give a new quantitative explanation of the high-active and low-active regimes of aluminization. It is, in particular, confirmed that the high-active and low-active regimes of nickel aluminization can be carried out by a variation of the HCl/H<sub>2</sub> flow ratio. The most important, and a brand new, result concerns the entropy production rate. It is shown that its maxima coincidence with the two-phase zone boundaries in real space, which gives new insight into the modeling of the diffusion in ternary systems.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"20 1-2-3","pages":"80-90"},"PeriodicalIF":0.0000,"publicationDate":"2014-02-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201307090","citationCount":"4","resultStr":"{\"title\":\"Aluminizing of Nickel Alloys by CVD. The Effect of HCl Flow†\",\"authors\":\"Bartek Wierzba,&nbsp;Katarzyna Tkacz-Śmiech,&nbsp;Andrzej Nowotnik,&nbsp;Kamil Dychtoń\",\"doi\":\"10.1002/cvde.201307090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n <section>\\n \\n <p>The solid-state diffusion in binary and ternary systems is overall treated and modeled using the bi-velocity method. The mathematical formulation is given, and the boundary conditions discussed. The model allows the calculation of concentration profiles, spatial distribution of the entropy production rate, and diffusion path. The last two can be used to identify the phases present in the diffusion zone of the ternary system, and determine the thicknesses of the respective layers. The model is applied for the first time to simulate diffusion during aluminization of nickel and its super-alloys, MAR-M200 + Hf and CMSX-4, and the predictions are compared with the results of the experiments performed by the authors. The results give a new quantitative explanation of the high-active and low-active regimes of aluminization. It is, in particular, confirmed that the high-active and low-active regimes of nickel aluminization can be carried out by a variation of the HCl/H<sub>2</sub> flow ratio. The most important, and a brand new, result concerns the entropy production rate. It is shown that its maxima coincidence with the two-phase zone boundaries in real space, which gives new insight into the modeling of the diffusion in ternary systems.</p>\\n </section>\\n </div>\",\"PeriodicalId\":10093,\"journal\":{\"name\":\"Chemical Vapor Deposition\",\"volume\":\"20 1-2-3\",\"pages\":\"80-90\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-02-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1002/cvde.201307090\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chemical Vapor Deposition\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201307090\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201307090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

用双速度方法对二元和三元体系中的固态扩散进行了全面的处理和建模。给出了其数学表达式,并讨论了边界条件。该模型可以计算浓度分布、熵产率的空间分布和扩散路径。最后两种方法可用于识别三元体系扩散区内存在的相,并确定各自层的厚度。该模型首次应用于镍及其高温合金MAR-M200 + Hf和CMSX-4渗铝过程的扩散模拟,并与作者的实验结果进行了比较。结果对高活性和低活性的渗铝过程给出了新的定量解释。特别地,证实了高活性和低活性的镍铝化可以通过HCl/H2流动比的变化来实现。最重要的,也是一个全新的结果与熵产率有关。结果表明,在实际空间中,其极值与两相区边界重合,为三元体系扩散的建模提供了新的思路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Aluminizing of Nickel Alloys by CVD. The Effect of HCl Flow†

Aluminizing of Nickel Alloys by CVD. The Effect of HCl Flow†

The solid-state diffusion in binary and ternary systems is overall treated and modeled using the bi-velocity method. The mathematical formulation is given, and the boundary conditions discussed. The model allows the calculation of concentration profiles, spatial distribution of the entropy production rate, and diffusion path. The last two can be used to identify the phases present in the diffusion zone of the ternary system, and determine the thicknesses of the respective layers. The model is applied for the first time to simulate diffusion during aluminization of nickel and its super-alloys, MAR-M200 + Hf and CMSX-4, and the predictions are compared with the results of the experiments performed by the authors. The results give a new quantitative explanation of the high-active and low-active regimes of aluminization. It is, in particular, confirmed that the high-active and low-active regimes of nickel aluminization can be carried out by a variation of the HCl/H2 flow ratio. The most important, and a brand new, result concerns the entropy production rate. It is shown that its maxima coincidence with the two-phase zone boundaries in real space, which gives new insight into the modeling of the diffusion in ternary systems.

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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
自引率
0.00%
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0
审稿时长
>12 weeks
期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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