喷雾热解法制备CuO薄膜的结构、光学和电学性能:退火工艺的影响

IF 1.2 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
R. Daira, B. Boudjema, A. Mohammedi
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引用次数: 0

摘要

本文采用喷雾热解技术在玻璃衬底上制备了CuO薄膜,研究了不同退火时间对薄膜结构、光学和电学性能的影响。XRD分析表明,具有多晶结构的膜具有(单斜)结构。此外,晶粒相CuO随着退火温度的升高而增加。此外,具有沿着(002)峰的优选取向。光学性质证实,所制备的薄膜具有70%的透射率。我们已经发现,带隙能量(Eg)是相对于退火温度-时间的递减函数。此外,在不同退火时间生长的薄膜的电阻率在18.97至4.58KOhm.cm之间变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural, optical and electrical properties of CuO thin films deposited by spray pyrolysis technique: influence annealing process
In this work, CuO thin films about the synthesis of the thin films are prepared on glass substrate using spray pyrolysis technique at room temperature different annealing times in temperature 450 0 C.In order to study the effect of annealing times onthe structural, optical and electrical properties.XRD analysis has shown that films with a polycrystalline structurehave a(Monoclinic) structure.In addition, the crystallite phase CuO increases with increasing of annealing temperature.Moreover, with a preferred orientation along (002) peak.The optical properties confirmed that the elaborated films have a transmittance of 70%. We have found that the band gap energy (Eg) is a decreasing function with respect to the annealing temperature time. In addition, the electrical resistivity varies from 18.97 to 4.58 KOhm.cm for the films grown at different annealing times.
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来源期刊
Chalcogenide Letters
Chalcogenide Letters MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
1.80
自引率
20.00%
发文量
86
审稿时长
1 months
期刊介绍: Chalcogenide Letters (CHL) has the aim to publish rapidly papers in chalcogenide field of research and appears with twelve issues per year. The journal is open to letters, short communications and breakings news inserted as Short Notes, in the field of chalcogenide materials either amorphous or crystalline. Short papers in structure, properties and applications, as well as those covering special properties in nano-structured chalcogenides are admitted.
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