使用电子冲击金属蒸气源将金属元素注入电子束离子阱

IF 1.5 4区物理与天体物理 Q3 OPTICS

Journal of Physics B: Atomic, Molecular and Optical Physics Pub Date : 2023-08-23 DOI:10.1088/1361-6455/acf354

N. Kimura, Genichi Kiyama, Daiki Ito, N. Nakamura

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引用次数: 0

摘要

我们展示了一种使用金属蒸气源将金属元素注入电子束离子阱的通用方法。该方法基于通过连续电子束冲击蒸发金属靶。我们给出了通过本注入方案制备的高电荷钨离子的可见光发射光谱。与使用高蒸气压W（CO）6化合物的常规注入方法相比，发现本方法的几个优点，即抑制陷阱区域中的电荷交换反应和停止注入后快速恢复真空条件。本发明的注入方法还便于测量高电荷铌离子的发射光谱，这在以前从未使用电子束离子阱观察到。

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Injection of metallic elements into an electron-beam ion trap using an electron impact metal vapor source

We demonstrate a versatile method for injecting metallic elements into an electron-beam ion trap using a metal vapor source. This method is based on the evaporation of a metal target by continuous electron-beam impact. We present visible emission spectra of highly charged tungsten ions prepared by the present injection scheme. By comparison with the conventional injection method using a high-vapor-pressure W(CO)6 compound, several advantages of the present method, i.e. suppressing charge exchange reactions in the trap region and quick recovery of the vacuum condition after stopping the injection, are found. The present injection method also facilitates the measurement of emission spectra of highly charged niobium ions, which have never previously been observed using electron-beam ion traps.

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来源期刊

Journal of Physics B: Atomic, Molecular and Optical Physics 物理-光学

CiteScore

3.60

自引率

6.20%

发文量

182

审稿时长

2.8 months

期刊介绍： Published twice-monthly (24 issues per year), Journal of Physics B: Atomic, Molecular and Optical Physics covers the study of atoms, ions, molecules and clusters, and their structure and interactions with particles, photons or fields. The journal also publishes articles dealing with those aspects of spectroscopy, quantum optics and non-linear optics, laser physics, astrophysics, plasma physics, chemical physics, optical cooling and trapping and other investigations where the objects of study are the elementary atomic, ionic or molecular properties of processes.