ALD沉积MoS2中低空间频率和高空间频率激光诱导周期性表面结构的形成

IF 4.1 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Malte Becher, J. Jagosz, C. Bock, A. Ostendorf, E. Gurevich
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引用次数: 0

摘要

实验研究了原子层沉积(ALD)二硫化钼(MoS2)在飞秒激光加工过程中激光诱导周期性表面结构(lipss)的形成。确定了周期性纳米结构形成的平均激光功率和扫描速度等激光加工参数。利用光学显微镜和扫描电镜对不同的LIPSS地层及其之间的过渡进行了参数区识别。可以观察到λLSFL≈1.1 μm和λHSFL≈83 nm两个不同周期的高、低频LIPSS (HSFL和LSFL)。在激光平均功率较高的情况下,高强流态占主导地位,而在较低的情况下,低强流态占主导地位。发现LIPSS的形成在较低的扫描速度下抑制激光烧蚀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Formation of low- and high-spatial frequency laser-induced periodic surface structures (LIPSSs) in ALD-deposited MoS2
The formation of laser-induced periodic surface structures (LIPSSs) on the atomic layer-deposited (ALD) molybdenum disulfide (MoS2) upon femtosecond laser processing is studied experimentally. Laser-processing parameters such as average laser power and the scan speed at which the formation of the periodic nanostructures takes place are identified. Optical and scanning electron microscopy are applied to identify the parameter regions for the different LIPSS formations and transitions between them. High- and low-spatial frequency LIPSS (HSFL and LSFL) with two distinct periods λLSFL ≈ 1.1 μm and λHSFL ≈ 83 nm can be observed. The HSFL are dominating at higher and the LSFL at lower laser average powers. Formation of LIPSS is found to inhibit laser ablation at lower scan speeds.
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来源期刊
Frontiers in Nanotechnology
Frontiers in Nanotechnology Engineering-Electrical and Electronic Engineering
CiteScore
7.10
自引率
0.00%
发文量
96
审稿时长
13 weeks
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