以氧化三异丙醇钒为前驱体和H2O为反应物,ALD沉积VO2薄膜的MIT特性

IF 1.4 4区 材料科学 Q3 MATERIALS SCIENCE, CERAMICS
C. Shin, Hyeongsu Choi, Hyunwoo Park, C. Jung, S. Song, H. Jeon, Youngjoon Kim, Jong-Wha Kim, Keunsik Kim, Young-Gyo Choi, H. Seo, Namgue Lee, Hyun-Su Yuk
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MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
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来源期刊
Journal of Ceramic Processing Research
Journal of Ceramic Processing Research 工程技术-材料科学:硅酸盐
CiteScore
2.00
自引率
69.20%
发文量
0
审稿时长
8 months
期刊介绍: The JOURNAL OF CERAMIC PROCESSING RESEARCH aims to publish original research articles covering the influence of processing routes on the microstructure and properties of ceramics and ceramic-based materials. The journal is managed by Hanyang University Press and overseen by an in-house editorial team of professional editors for a rigorous peer-review process with rapid publication.
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