纳米电子器件的1/f噪声光谱与噪声裁剪

IF 2.5 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Z. Balogh, G. Mezei, László Pósa, Botond Sánta, A. Magyarkuti, A. Halbritter
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引用次数: 3

摘要

在本文中,我们回顾了纳米电子器件的1/f型噪声特性,重点介绍了三个示范平台:电阻开关存储器,石墨烯纳米隙和单分子纳米线。这种超小型器件的功能被限制在极小的体积内,在这种情况下,对噪声的总体考虑失去了有效性:波动器的相对贡献在很大程度上取决于它与器件瓶颈的距离,噪声特性对纳米级器件的几何形状和大多数非经典传输机制的细节很敏感。所有这些都反映在噪声特性对有源器件体积(以及相关器件电阻)、频率或施加电压的高度系统特异性依赖上。因此,1/f型噪声测量可以作为研究的纳米电子系统中相关传输和噪声产生机制的丰富指纹。最后,我们证明了1/f型噪声分析不仅促进了基本的理解和有针对性的噪声抑制,而且新的概率计算硬件平台大量寻找可定制的纳米电噪声源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
1/f noise spectroscopy and noise tailoring of nanoelectronic devices
In this paper, we review the 1/f-type noise properties of nanoelectronic devices focusing on three demonstrative platforms: resistive switching memories, graphene nanogaps and single-molecule nanowires. The functionality of such ultrasmall devices is confined to an extremely small volume, where bulk considerations on the noise lose their validity: the relative contribution of a fluctuator heavily depends on its distance from the device bottleneck, and the noise characteristics are sensitive to the nanometer-scale device geometry and details of the mostly non-classical transport mechanism. All these are reflected by a highly system-specific dependence of the noise properties on the active device volume (and the related device resistance), the frequency, or the applied voltage. Accordingly, 1/f-type noise measurements serve as a rich fingerprint of the relevant transport and noise-generating mechanisms in the studied nanoelectronic systems. Finally, we demonstrate that not only the fundamental understanding and the targeted noise suppression is fueled by the 1/f-type noise analysis, but novel probabilistic computing hardware platforms heavily seek well tailorable nanoelectric noise sources.
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来源期刊
Nano Futures
Nano Futures Chemistry-General Chemistry
CiteScore
4.30
自引率
0.00%
发文量
35
期刊介绍: Nano Futures mission is to reflect the diverse and multidisciplinary field of nanoscience and nanotechnology that now brings together researchers from across physics, chemistry, biomedicine, materials science, engineering and industry.
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