Ankush Chattopadhyay , Chandan K. Sarkar , Chayanika Bose
{"title":"亚阈值区下叠层栅-叠层渐变沟道结累积模式无结FET的紧凑分析建模","authors":"Ankush Chattopadhyay , Chandan K. Sarkar , Chayanika Bose","doi":"10.1016/j.spmi.2021.107110","DOIUrl":null,"url":null,"abstract":"<div><p><span>This paper presents the compact analytical model of underlap gate stack (GS) graded channel (GC) junction accumulation mode (JAM) junctionless (JL) FET. At first, a comparative analysis between the two different graded channel schemes and non-graded channel is performed based on </span><em>I</em><sub><em>ON</em></sub>, <em>I</em><sub><em>OFF</em></sub> and <em>I</em><sub><em>ON</em></sub>/<em>I</em><sub><em>OFF</em></sub> ratio. The scheme that yields the higher <em>I</em><sub><em>ON</em></sub>/<em>I</em><sub><em>OFF</em></sub> ratio along with smaller <em>I</em><sub><em>OFF</em></sub><span>, is adopted in the proposed JL FET for further analysis. The 2D analytical modeling<span> of the GS-GC-JAM-JL FET deals with the determination of surface potential, threshold voltage, subthreshold drain current, DIBL and subthreshold swing. Results obtained from analytical model and simulations are compared and an excellent match is found. Thus the present paper establishes the outstanding ability of proposed underlap GS-GC-JAM-JL FET architecture to shield the short channel effects without sacrificing its performance, and therefore, proves it as a potential candidate for ultra-low power applications.</span></span></p></div>","PeriodicalId":22044,"journal":{"name":"Superlattices and Microstructures","volume":"162 ","pages":"Article 107110"},"PeriodicalIF":3.3000,"publicationDate":"2022-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Compact analytical modeling of underlap gate stack graded channel junction accumulation mode junctionless FET in subthreshold regime\",\"authors\":\"Ankush Chattopadhyay , Chandan K. Sarkar , Chayanika Bose\",\"doi\":\"10.1016/j.spmi.2021.107110\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p><span>This paper presents the compact analytical model of underlap gate stack (GS) graded channel (GC) junction accumulation mode (JAM) junctionless (JL) FET. At first, a comparative analysis between the two different graded channel schemes and non-graded channel is performed based on </span><em>I</em><sub><em>ON</em></sub>, <em>I</em><sub><em>OFF</em></sub> and <em>I</em><sub><em>ON</em></sub>/<em>I</em><sub><em>OFF</em></sub> ratio. The scheme that yields the higher <em>I</em><sub><em>ON</em></sub>/<em>I</em><sub><em>OFF</em></sub> ratio along with smaller <em>I</em><sub><em>OFF</em></sub><span>, is adopted in the proposed JL FET for further analysis. The 2D analytical modeling<span> of the GS-GC-JAM-JL FET deals with the determination of surface potential, threshold voltage, subthreshold drain current, DIBL and subthreshold swing. Results obtained from analytical model and simulations are compared and an excellent match is found. Thus the present paper establishes the outstanding ability of proposed underlap GS-GC-JAM-JL FET architecture to shield the short channel effects without sacrificing its performance, and therefore, proves it as a potential candidate for ultra-low power applications.</span></span></p></div>\",\"PeriodicalId\":22044,\"journal\":{\"name\":\"Superlattices and Microstructures\",\"volume\":\"162 \",\"pages\":\"Article 107110\"},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2022-02-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Superlattices and Microstructures\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0749603621003116\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Superlattices and Microstructures","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0749603621003116","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Compact analytical modeling of underlap gate stack graded channel junction accumulation mode junctionless FET in subthreshold regime
This paper presents the compact analytical model of underlap gate stack (GS) graded channel (GC) junction accumulation mode (JAM) junctionless (JL) FET. At first, a comparative analysis between the two different graded channel schemes and non-graded channel is performed based on ION, IOFF and ION/IOFF ratio. The scheme that yields the higher ION/IOFF ratio along with smaller IOFF, is adopted in the proposed JL FET for further analysis. The 2D analytical modeling of the GS-GC-JAM-JL FET deals with the determination of surface potential, threshold voltage, subthreshold drain current, DIBL and subthreshold swing. Results obtained from analytical model and simulations are compared and an excellent match is found. Thus the present paper establishes the outstanding ability of proposed underlap GS-GC-JAM-JL FET architecture to shield the short channel effects without sacrificing its performance, and therefore, proves it as a potential candidate for ultra-low power applications.
期刊介绍:
Micro and Nanostructures is a journal disseminating the science and technology of micro-structures and nano-structures in materials and their devices, including individual and collective use of semiconductors, metals and insulators for the exploitation of their unique properties. The journal hosts papers dealing with fundamental and applied experimental research as well as theoretical studies. Fields of interest, including emerging ones, cover:
• Novel micro and nanostructures
• Nanomaterials (nanowires, nanodots, 2D materials ) and devices
• Synthetic heterostructures
• Plasmonics
• Micro and nano-defects in materials (semiconductor, metal and insulators)
• Surfaces and interfaces of thin films
In addition to Research Papers, the journal aims at publishing Topical Reviews providing insights into rapidly evolving or more mature fields. Written by leading researchers in their respective fields, those articles are commissioned by the Editorial Board.
Formerly known as Superlattices and Microstructures, with a 2021 IF of 3.22 and 2021 CiteScore of 5.4