Gayathiri Elangovan, Deepak Ipe, Peter Reher, Carlos M Figueredo, Andrew B Cameron
{"title":"一种新的装置,用于标准化抛光协议,以实现钛和氧化锆圆盘表面的不同粗糙度。","authors":"Gayathiri Elangovan, Deepak Ipe, Peter Reher, Carlos M Figueredo, Andrew B Cameron","doi":"10.11607/ijp.8430","DOIUrl":null,"url":null,"abstract":"<p><strong>Purpose: </strong>To propose and evaluate standardized polishing protocols for in vitro experiments using a custommade apparatus under controlled force to create consistent surface roughness on titanium and zirconia discs.</p><p><strong>Materials and methods: </strong>A total of 160 discs were manufactured with a diameter of 10 mm, 80 titanium (Ti) and 80 zirconium oxide (Zr). Specimens were categorized into two groups: controlled force (CF) and without controlled force (WCF). Specimens in the CF group were polished with a custom apparatus incorporating a tension gauge on the Ti and Zr disc surfaces to achieve consistent roughness. The WCF group was polished without the use of a tension gauge. Each group had four subgroups (n = 10): control/machined with no polishing (C), rough (R), smooth (S), and very smooth (VS). The subgroups were processed using a sequence of diamond-impregnated polishing burs and polishing paste.</p><p><strong>Results: </strong>The CF group showed consistent surface roughness and a gradual decrease in surface roughness. Control in Ti (Ra = 6.5 ± 0.03 μm) and in Zr (Ra = 5.4 ± 0.04 μm); R in Ti (Ra = 3.5 ± 0.06 μm) and in Zr (Ra = 3.2 ± 0.07 μm); S in Ti (Ra = 1.5 ± 0.04 μm) and in Zr (Ra = 1.1 ± 0.06 μm); and VS in Ti (Ra = 0.05 ± 0.002 μm) and in Zr (Ra = 0.02 ± 0.005 μm). There were significant differences for R, S, and SV under CF and WCF in Ti and Zr surfaces.</p><p><strong>Conclusions: </strong>The specimens polished under control force produced significantly more uniform surface roughness than those polished without controlled force and were produced with a higher degree of consistency.</p>","PeriodicalId":94232,"journal":{"name":"The International journal of prosthodontics","volume":"0 0","pages":"417-422"},"PeriodicalIF":0.0000,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A Novel Apparatus to Standardize the Polishing Protocol to Achieve Different Roughness of Titanium and Zirconia Disc Surfaces.\",\"authors\":\"Gayathiri Elangovan, Deepak Ipe, Peter Reher, Carlos M Figueredo, Andrew B Cameron\",\"doi\":\"10.11607/ijp.8430\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><strong>Purpose: </strong>To propose and evaluate standardized polishing protocols for in vitro experiments using a custommade apparatus under controlled force to create consistent surface roughness on titanium and zirconia discs.</p><p><strong>Materials and methods: </strong>A total of 160 discs were manufactured with a diameter of 10 mm, 80 titanium (Ti) and 80 zirconium oxide (Zr). Specimens were categorized into two groups: controlled force (CF) and without controlled force (WCF). Specimens in the CF group were polished with a custom apparatus incorporating a tension gauge on the Ti and Zr disc surfaces to achieve consistent roughness. The WCF group was polished without the use of a tension gauge. Each group had four subgroups (n = 10): control/machined with no polishing (C), rough (R), smooth (S), and very smooth (VS). The subgroups were processed using a sequence of diamond-impregnated polishing burs and polishing paste.</p><p><strong>Results: </strong>The CF group showed consistent surface roughness and a gradual decrease in surface roughness. Control in Ti (Ra = 6.5 ± 0.03 μm) and in Zr (Ra = 5.4 ± 0.04 μm); R in Ti (Ra = 3.5 ± 0.06 μm) and in Zr (Ra = 3.2 ± 0.07 μm); S in Ti (Ra = 1.5 ± 0.04 μm) and in Zr (Ra = 1.1 ± 0.06 μm); and VS in Ti (Ra = 0.05 ± 0.002 μm) and in Zr (Ra = 0.02 ± 0.005 μm). There were significant differences for R, S, and SV under CF and WCF in Ti and Zr surfaces.</p><p><strong>Conclusions: </strong>The specimens polished under control force produced significantly more uniform surface roughness than those polished without controlled force and were produced with a higher degree of consistency.</p>\",\"PeriodicalId\":94232,\"journal\":{\"name\":\"The International journal of prosthodontics\",\"volume\":\"0 0\",\"pages\":\"417-422\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-08-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The International journal of prosthodontics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.11607/ijp.8430\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The International journal of prosthodontics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.11607/ijp.8430","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Novel Apparatus to Standardize the Polishing Protocol to Achieve Different Roughness of Titanium and Zirconia Disc Surfaces.
Purpose: To propose and evaluate standardized polishing protocols for in vitro experiments using a custommade apparatus under controlled force to create consistent surface roughness on titanium and zirconia discs.
Materials and methods: A total of 160 discs were manufactured with a diameter of 10 mm, 80 titanium (Ti) and 80 zirconium oxide (Zr). Specimens were categorized into two groups: controlled force (CF) and without controlled force (WCF). Specimens in the CF group were polished with a custom apparatus incorporating a tension gauge on the Ti and Zr disc surfaces to achieve consistent roughness. The WCF group was polished without the use of a tension gauge. Each group had four subgroups (n = 10): control/machined with no polishing (C), rough (R), smooth (S), and very smooth (VS). The subgroups were processed using a sequence of diamond-impregnated polishing burs and polishing paste.
Results: The CF group showed consistent surface roughness and a gradual decrease in surface roughness. Control in Ti (Ra = 6.5 ± 0.03 μm) and in Zr (Ra = 5.4 ± 0.04 μm); R in Ti (Ra = 3.5 ± 0.06 μm) and in Zr (Ra = 3.2 ± 0.07 μm); S in Ti (Ra = 1.5 ± 0.04 μm) and in Zr (Ra = 1.1 ± 0.06 μm); and VS in Ti (Ra = 0.05 ± 0.002 μm) and in Zr (Ra = 0.02 ± 0.005 μm). There were significant differences for R, S, and SV under CF and WCF in Ti and Zr surfaces.
Conclusions: The specimens polished under control force produced significantly more uniform surface roughness than those polished without controlled force and were produced with a higher degree of consistency.