铝在无水离子液体/油界面上的还原沉积

IF 4.7 3区 工程技术 Q2 ELECTROCHEMISTRY
Naohiro Yoshida, Yohei Kuroyama, Yuko Yokoyama, Tetsuo Sakka, Naoya Nishi
{"title":"铝在无水离子液体/油界面上的还原沉积","authors":"Naohiro Yoshida,&nbsp;Yohei Kuroyama,&nbsp;Yuko Yokoyama,&nbsp;Tetsuo Sakka,&nbsp;Naoya Nishi","doi":"10.1016/j.elecom.2023.107575","DOIUrl":null,"url":null,"abstract":"<div><p>The oil/water interface has been used as a reaction field for interfacial metal deposition via electron transfer between metal ions and reducing agents across the interface. However, the metals that can be deposited at liquid/liquid interfaces are limited to noble metals whose standard redox potential is more positive than that of water. In the present study, we designed a water-free liquid/liquid interface between a hydrophilic ionic liquid (IL) and oil (O) and succeeded in reductively depositing Al, a base metal that has a significantly negative standard redox potential and that is not reduced at water-based liquid/liquid interfaces. The morphology of the deposited Al was investigated and the reaction mechanism was explained as a combination of electron transfer and ion transfer across the IL/O interface.</p></div>","PeriodicalId":304,"journal":{"name":"Electrochemistry Communications","volume":"156 ","pages":"Article 107575"},"PeriodicalIF":4.7000,"publicationDate":"2023-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Reductive deposition of aluminum at a water-free ionic liquid/oil interface\",\"authors\":\"Naohiro Yoshida,&nbsp;Yohei Kuroyama,&nbsp;Yuko Yokoyama,&nbsp;Tetsuo Sakka,&nbsp;Naoya Nishi\",\"doi\":\"10.1016/j.elecom.2023.107575\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The oil/water interface has been used as a reaction field for interfacial metal deposition via electron transfer between metal ions and reducing agents across the interface. However, the metals that can be deposited at liquid/liquid interfaces are limited to noble metals whose standard redox potential is more positive than that of water. In the present study, we designed a water-free liquid/liquid interface between a hydrophilic ionic liquid (IL) and oil (O) and succeeded in reductively depositing Al, a base metal that has a significantly negative standard redox potential and that is not reduced at water-based liquid/liquid interfaces. The morphology of the deposited Al was investigated and the reaction mechanism was explained as a combination of electron transfer and ion transfer across the IL/O interface.</p></div>\",\"PeriodicalId\":304,\"journal\":{\"name\":\"Electrochemistry Communications\",\"volume\":\"156 \",\"pages\":\"Article 107575\"},\"PeriodicalIF\":4.7000,\"publicationDate\":\"2023-09-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrochemistry Communications\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1388248123001492\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrochemistry Communications","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1388248123001492","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 0

摘要

油/水界面已被用作界面金属沉积的反应场,该反应场通过金属离子和还原剂之间的电子转移穿过界面进行沉积。然而,可以沉积在液体/液体界面的金属仅限于贵金属,其标准氧化还原电位比水的氧化还原电位更正。在本研究中,我们在亲水性离子液体(IL)和油(O)之间设计了一种无水的液体/液体界面,并成功地还原沉积了Al,这是一种具有显著负标准氧化还原电位的基底金属,在水基液体/液体交界面上不被还原。研究了沉积Al的形态,并将反应机理解释为通过IL/O界面的电子转移和离子转移的结合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reductive deposition of aluminum at a water-free ionic liquid/oil interface

The oil/water interface has been used as a reaction field for interfacial metal deposition via electron transfer between metal ions and reducing agents across the interface. However, the metals that can be deposited at liquid/liquid interfaces are limited to noble metals whose standard redox potential is more positive than that of water. In the present study, we designed a water-free liquid/liquid interface between a hydrophilic ionic liquid (IL) and oil (O) and succeeded in reductively depositing Al, a base metal that has a significantly negative standard redox potential and that is not reduced at water-based liquid/liquid interfaces. The morphology of the deposited Al was investigated and the reaction mechanism was explained as a combination of electron transfer and ion transfer across the IL/O interface.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Electrochemistry Communications
Electrochemistry Communications 工程技术-电化学
CiteScore
8.50
自引率
3.70%
发文量
160
审稿时长
1.2 months
期刊介绍: Electrochemistry Communications is an open access journal providing fast dissemination of short communications, full communications and mini reviews covering the whole field of electrochemistry which merit urgent publication. Short communications are limited to a maximum of 20,000 characters (including spaces) while full communications and mini reviews are limited to 25,000 characters (including spaces). Supplementary information is permitted for full communications and mini reviews but not for short communications. We aim to be the fastest journal in electrochemistry for these types of papers.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信