表面活性剂蛋白B (SFTPB)内含子4 CA-repeat-rich区域内的基序对mRNA剪接的影响存在差异。

Journal of molecular biochemistry Pub Date : 2013-02-20
Wenjun Yang, Lan Ni, Patricia Silveyra, Guirong Wang, Georgios T Noutsios, Anamika Singh, Susan L Diangelo, Olabisi Sanusi, Manmeet Raval, Joanna Floros
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引用次数: 0

摘要

表面活性剂蛋白B (SP-B)基因内含子4的前半部分是一个富含ca重复序列的区域,包含11个基序。为了研究该区域在SP-B mRNA剪接中的作用,通过系统地从5'或3'端去除基序来产生minigenes。将它们转染CHO细胞,研究它们的剪接效率。后者以SP-B RNA完全剪接与不完全剪接的比例来确定。我们的结果表明SP-B内含子4基序对剪接的影响是不同的。基序8和9分别显著增强和减少内含子4的剪接。使用Motif 8序列(包含一个cac顺式元件和细胞提取物)进行的RNA迁移性转移实验导致该元件突变时RNA:蛋白质迁移丢失。此外,对带有和不带有motif 8的minigenes的mRNA二级结构稳定性的硅分析表明,mRNA稳定性与剪接率之间存在相关性。我们得出结论,特定内含子4基序的差异缺失导致以下一种或多种情况:a)剪接改变,b) RNA稳定性差异,c)二级结构改变。这些反过来又可能影响肺部健康或疾病中的SP-B含量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Motifs within the CA-repeat-rich region of Surfactant Protein B (SFTPB) intron 4 differentially affect mRNA splicing.

The first half of the surfactant protein B (SP-B) gene intron 4 is a CA-repeat-rich region that contains 11 motifs. To study the role of this region on SP-B mRNA splicing, minigenes were generated by systematic removal of motifs from either the 5' or 3' end. These were transfected in CHO cells to study their splicing efficiency. The latter was determined as the ratio of completely to incompletely spliced SP-B RNA. Our results indicate that SP-B intron 4 motifs differentially affect splicing. Motifs 8 and 9 significantly enhanced and reduced splicing of intron 4, respectively. RNA mobility shift assays performed with a Motif 8 sequence that contains a CAUC cis-element and cell extracts resulted in a RNA:protein shift that was lost upon mutation of the element. Furthermore, in silico analysis of mRNA secondary structure stability for minigenes with and without motif 8 indicated a correlation between mRNA stability and splicing ratio. We conclude that differential loss of specific intron 4 motifs results in one or more of the following: a) altered splicing, b) differences in RNA stability and c) changes in secondary structure. These, in turn, may affect SP-B content in lung health or disease.

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