长、短激光脉冲波纹对材料表面和体结构的影响:最新进展

IF 7.4 1区 物理与天体物理 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Ričardas Buividas , Mindaugas Mikutis , Saulius Juodkazis
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引用次数: 229

摘要

固体材料与高强度/辐照度激光脉冲相互作用后,表面会形成波纹。当使用超短的亚1ps激光脉冲时,观察到的表面波纹的形态比长激光脉冲形成的波纹要复杂得多。独特的是,对于短激光脉冲,可以在体中形成波纹。我们迫切需要更好地理解涟漪形成过程中光与物质相互作用的基本原理。首先总结了实验观测到的波纹及其参数与激光制造条件和材料性能的关系。然后,对相关的波纹形成机制进行了批判性的回顾,并进行了讨论,并提出了形成的猜想。结果表明,必须考虑到高强度超短激光脉冲在表面和体中形成亚临界或临界密度的等离子体(即固态或击穿等离子体),以解释实验观察结果。在电介质上/中形成的表面和体波纹可以用相同的模型来解释,其中电子空穴(固态)等离子体在波纹形成的非常阈值处形成。波纹图案具有很强的应用潜力,从传感到光收集和(光)催化,主要是由于纳米尺度的特征和图案在大宏观区域的自我复制。介绍了几个新兴的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface and bulk structuring of materials by ripples with long and short laser pulses: Recent advances

Ripples are formed on the surface of solid materials after interaction with laser pulses of high intensity/irradiance. When ultra-short sub-1 ps laser pulses are used, the observed morphology of ripples on surfaces becomes much more complex as compared with ripples formed by long laser pulses. Uniquely for the short laser pulses, ripples can be formed in the bulk. A better understanding of the fundamentals of light-matter interaction in ripples formation is strongly required. Experimentally observed ripples and dependence of their parameters on laser fabrication conditions and material properties are summarized first. Then, a critical review of relevant ripple formation mechanisms is presented, discussed, and formation conjectures are presented.

It is shown that formation of plasma at sub-critical or critical densities (i.e., solid state or breakdown plasmas) on the surface and in the bulk specific to the high-intensity ultra-short laser pulses has to be considered to account for the experimental observations. Surface and bulk ripples formed on/in dielectrics can be explained by the same model where electron–hole (solid state) plasma is formed at the very threshold of ripples formation. Ripple patterns have a strong application potential from sensing to light harvesting and (photo)catalysis mainly due to nanoscale features and self-replication of pattern over large macroscopic areas. Several emerging applications are shown.

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来源期刊
Progress in Quantum Electronics
Progress in Quantum Electronics 工程技术-工程:电子与电气
CiteScore
18.50
自引率
0.00%
发文量
23
审稿时长
150 days
期刊介绍: Progress in Quantum Electronics, established in 1969, is an esteemed international review journal dedicated to sharing cutting-edge topics in quantum electronics and its applications. The journal disseminates papers covering theoretical and experimental aspects of contemporary research, including advances in physics, technology, and engineering relevant to quantum electronics. It also encourages interdisciplinary research, welcoming papers that contribute new knowledge in areas such as bio and nano-related work.
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