{"title":"微通道外延","authors":"Shigeya Naritsuka","doi":"10.1016/j.pcrysgrow.2016.04.016","DOIUrl":null,"url":null,"abstract":"<div><p><span>Microchannel epitaxy<span> (MCE) is an outstanding technique for dislocation reduction during heteroepitaxial growth when there is a large lattice mismatch. This paper describes the MCE mechanism in detail together with experimental results. Directional growth is a principal concern of MCE, and is enabled through the assessment and control of the elementary processes of crystal growth. Vertical microchannel epitaxy (V-MCE) involves perpendicular growth relative to a substrate, from microchannels established as openings in a mask, while horizontal microchannel epitaxy (H-MCE) is growth parallel to the substrate surface. Even if many dislocations are present in the microchannels, directional growth vastly reduces their number in the grown crystal. MCE is beneficial for the fabrication of devices, as well as the quantitative study of the fundamental processes involved in crystal growth. This paper quantitatively discusses the growth mechanism involved in H-MCE of GaAs in the thickness direction. Fitting the forms of spiral steps observed on flat surfaces at an atomic level enables the accurate derivation of surface </span></span>supersaturation at the time of growth. Moreover, since a simple mechanism for controlling growth in the vertical direction can be established for H-MCE with a single step source, quantitative discussion of crystal-growth mechanisms is now possible.</p></div>","PeriodicalId":409,"journal":{"name":"Progress in Crystal Growth and Characterization of Materials","volume":null,"pages":null},"PeriodicalIF":4.5000,"publicationDate":"2016-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.pcrysgrow.2016.04.016","citationCount":"0","resultStr":"{\"title\":\"Microchannel epitaxy\",\"authors\":\"Shigeya Naritsuka\",\"doi\":\"10.1016/j.pcrysgrow.2016.04.016\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p><span>Microchannel epitaxy<span> (MCE) is an outstanding technique for dislocation reduction during heteroepitaxial growth when there is a large lattice mismatch. This paper describes the MCE mechanism in detail together with experimental results. Directional growth is a principal concern of MCE, and is enabled through the assessment and control of the elementary processes of crystal growth. Vertical microchannel epitaxy (V-MCE) involves perpendicular growth relative to a substrate, from microchannels established as openings in a mask, while horizontal microchannel epitaxy (H-MCE) is growth parallel to the substrate surface. Even if many dislocations are present in the microchannels, directional growth vastly reduces their number in the grown crystal. MCE is beneficial for the fabrication of devices, as well as the quantitative study of the fundamental processes involved in crystal growth. This paper quantitatively discusses the growth mechanism involved in H-MCE of GaAs in the thickness direction. Fitting the forms of spiral steps observed on flat surfaces at an atomic level enables the accurate derivation of surface </span></span>supersaturation at the time of growth. Moreover, since a simple mechanism for controlling growth in the vertical direction can be established for H-MCE with a single step source, quantitative discussion of crystal-growth mechanisms is now possible.</p></div>\",\"PeriodicalId\":409,\"journal\":{\"name\":\"Progress in Crystal Growth and Characterization of Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2016-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/j.pcrysgrow.2016.04.016\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Progress in Crystal Growth and Characterization of Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0960897416300195\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CRYSTALLOGRAPHY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Progress in Crystal Growth and Characterization of Materials","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0960897416300195","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CRYSTALLOGRAPHY","Score":null,"Total":0}
Microchannel epitaxy (MCE) is an outstanding technique for dislocation reduction during heteroepitaxial growth when there is a large lattice mismatch. This paper describes the MCE mechanism in detail together with experimental results. Directional growth is a principal concern of MCE, and is enabled through the assessment and control of the elementary processes of crystal growth. Vertical microchannel epitaxy (V-MCE) involves perpendicular growth relative to a substrate, from microchannels established as openings in a mask, while horizontal microchannel epitaxy (H-MCE) is growth parallel to the substrate surface. Even if many dislocations are present in the microchannels, directional growth vastly reduces their number in the grown crystal. MCE is beneficial for the fabrication of devices, as well as the quantitative study of the fundamental processes involved in crystal growth. This paper quantitatively discusses the growth mechanism involved in H-MCE of GaAs in the thickness direction. Fitting the forms of spiral steps observed on flat surfaces at an atomic level enables the accurate derivation of surface supersaturation at the time of growth. Moreover, since a simple mechanism for controlling growth in the vertical direction can be established for H-MCE with a single step source, quantitative discussion of crystal-growth mechanisms is now possible.
期刊介绍:
Materials especially crystalline materials provide the foundation of our modern technologically driven world. The domination of materials is achieved through detailed scientific research.
Advances in the techniques of growing and assessing ever more perfect crystals of a wide range of materials lie at the roots of much of today''s advanced technology. The evolution and development of crystalline materials involves research by dedicated scientists in academia as well as industry involving a broad field of disciplines including biology, chemistry, physics, material sciences and engineering. Crucially important applications in information technology, photonics, energy storage and harvesting, environmental protection, medicine and food production require a deep understanding of and control of crystal growth. This can involve suitable growth methods and material characterization from the bulk down to the nano-scale.