脉冲激光沉积iii族氮化物薄膜的外延生长及其在LED器件中的应用

IF 8.2 1区 化学 Q1 CHEMISTRY, PHYSICAL
Guoqiang Li , Wenliang Wang , Weijia Yang , Haiyan Wang
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引用次数: 120

摘要

近年来,脉冲激光沉积(PLD)技术使得iii族氮化物在热活性衬底上的低温外延生长成为可能。脉冲激光烧蚀靶产生的前驱体在到达衬底时具有足够的动能,从而有效抑制了外延膜与衬底之间的界面反应,最终使薄膜在低温下生长成为可能。到目前为止,利用可编程逻辑器件已经成功地在各种热活性衬底上生长出高质量的iii族氮化外延薄膜。通过将PLD与激光光栅技术、分子束外延(MBE)和金属有机化学气相沉积(MOCVD)等技术相结合,在不同的热活性衬底上实现了iii -氮化物基发光二极管(LED)结构,并展示了高性能LED器件。本文综述了iii族氮化物在热活性衬底上的外延生长及其在LED器件开发中的应用。本文系统地综述了PLD生长的iii族氮化膜的表面形貌、膜与衬底之间的界面特性和结晶质量。本文还对大尺寸衬底上的薄膜均匀性、缺陷控制和PLD生长InGaN薄膜的解决方案进行了深入的讨论,并介绍了一些新的PLD技术,以实现LED结构,这为热活性衬底上的LED商业化提供了很大的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epitaxial growth of group III-nitride films by pulsed laser deposition and their use in the development of LED devices

Recently, pulsed laser deposition (PLD) technology makes viable the epitaxial growth of group III-nitrides on thermally active substrates at low temperature. The precursors generated from the pulsed laser ablating the target has enough kinetic energy when arriving at substrates, thereby effectively suppressing the interfacial reactions between the epitaxial films and the substrates, and eventually makes the film growth at low temperature possible. So far, high-quality group III-nitride epitaxial films have been successfully grown on a variety of thermally active substrates by PLD. By combining PLD with other technologies such as laser rastering technique, molecular beam epitaxy (MBE), and metal-organic chemical vapor deposition (MOCVD), III-nitride-based light-emitting diode (LED) structures have been realized on different thermally active substrates, with high-performance LED devices being demonstrated. This review focuses on the epitaxial growth of group III-nitrides on thermally active substrates by PLD and their use in the development of LED devices. The surface morphology, interfacial property between film and substrate, and crystalline quality of as-grown group III-nitride films by PLD, are systematically reviewed. The corresponding solutions for film homogeneity on large size substrates, defect control, and InGaN films growth by PLD are also discussed in depth, together with introductions to some newly developed technologies for PLD in order to realize LED structures, which provides great opportunities for commercialization of LEDs on thermally active substrates.

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来源期刊
Surface Science Reports
Surface Science Reports 化学-物理:凝聚态物理
CiteScore
15.90
自引率
2.00%
发文量
9
审稿时长
178 days
期刊介绍: Surface Science Reports is a journal that specializes in invited review papers on experimental and theoretical studies in the physics, chemistry, and pioneering applications of surfaces, interfaces, and nanostructures. The topics covered in the journal aim to contribute to a better understanding of the fundamental phenomena that occur on surfaces and interfaces, as well as the application of this knowledge to the development of materials, processes, and devices. In this journal, the term "surfaces" encompasses all interfaces between solids, liquids, polymers, biomaterials, nanostructures, soft matter, gases, and vacuum. Additionally, the journal includes reviews of experimental techniques and methods used to characterize surfaces and surface processes, such as those based on the interactions of photons, electrons, and ions with surfaces.
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