紫外辐照脱氧核糖核酸的抗核酸酶序列

Biochimica et Biophysica Acta (BBA) - Specialized Section on Nucleic Acids and Related Subjects Pub Date : 1964-11-15 DOI:10.1016/0926-6550(64)90075-1

R.B. Setlow, W.L. Carrier, F.J. Bollum

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引用次数: 66

摘要

用毒液磷酸二酯酶(EC 3.1.4.1)水解紫外线照射的DNA，产生抗酶降解的寡核苷酸序列。大多数寡核苷酸含有胸腺嘧啶二聚体，其序列一般结构为pXpTpT。含有二聚体的三核苷酸的数目和类型取决于DNA的碱基组成、照射波长和照射剂量。天然DNA中的二聚体通过在360 μ m光下用酵母提取物处理DNA来消除。它们从变性DNA中被缓慢清除，而从三核苷酸中则完全不会被清除。三核苷酸中二聚体在240 μ m辐照下的分裂与pXpTpT中的碱基X无关，而在280 μ m辐照下二聚体的形成速率与第三个碱基有关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Nuclease-resistant sequences in ultraviolet-irradiated deoxyribonucleic acid

Enzymic hydrolysis of ultraviolet-irradiated DNA with venom phosphodiesterase (EC 3.1.4.1) yields oligonucleotide sequences that are resistant to enzymic degradation. Most of the oligonucleotides contain thymine dimers in sequences whose general structure is pXp $TpT$ . The number and type of the dimer-containing trinucleotides depend on the base composition of the DNA, the irradiating wavelength, and the incident dose. Dimers in native DNA are eliminated by treatment of the DNA with an extract from yeast in the presence of 360-mμ light. They are eliminated very slowly from denatured DNA and not at all from trinucleotides. The splitting of dimers in trinucleotides by 240-mμ irradiation is independent of the base X in pXp $TpT$ , but the rate of formation of dimers by 280 mμ depends on the third base.

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Biochimica et Biophysica Acta (BBA) - Specialized Section on Nucleic Acids and Related Subjects

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