用于日盲和弱光成像的超灵敏超快自供电紫外光电探测器阵列。

IF 26.8 1区材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY

Advanced Materials Pub Date : 2025-10-17 DOI:10.1002/adma.202514968

Weilong Deng,Xiangyu Fan,Yuxuan Du,Shengyu Ma,Hanxu Zhang,Mengting Liu,Hao Zhang,Shuo Chen,Qiang Fu,Yumin Zhang,Yang Li,Siyu Han,Yang Wang,Tai Yao,Xianjie Wang,Bo Song

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引用次数: 0

摘要

基于宽禁带半导体（WBGSs）及其异质结构的自供电紫外探测器（pd）在超灵敏和超快弱光探测能力方面面临挑战。在这项工作中，基于CuNiO2/SiC p-n异质结的8 × 8紫外光电探测器阵列被证明可以在太阳盲和弱光条件下工作。该器件实现了4.6 nW·mm-2的弱光检测极限，45 ns的快速响应时间，104.2 mA·W-1的高响应率和3.4 × 1012 Jones的探测率，优于基于SiC和ga2o3基wbgs及其异质结构的自供电UV pd。器件的优异性能源于高界面质量、大内置电场、电荷输运的Fowler-Nordheim隧穿（FNT）以及增强异质结构处的光吸收。此外，探测器具有低于10-22 A2·Hz-1的低噪声功率密度和5 kHz的高截止频率，使其能够在太阳照射下保持高对比度实时反射成像能力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Ultrasensitive and Ultrafast Self-Powered Ultraviolet Photodetector Array for Solar-Blind and Weak-Light Imaging.

Self-powered ultraviolet (UV) photodetectors (PDs) based on wide bandgap semiconductors (WBGSs) and their heterostructures face challenges in ultrasensitive and ultrafast weak-light detection capabilities. In this work, an 8 × 8 UV photodetector array based on CuNiO2/SiC p-n heterojunctions is demonstrated to operate in both solar-blind and weak-light conditions. The device achieves a weak-light detection limit of 4.6 nW·mm-2, a fast response time of 45 ns, and a high responsivity of 104.2 mA·W-1 and a detectivity of 3.4 × 1012 Jones, outperforming self-powered UV PDs based on SiC and Ga2O3-based WBGSs and their heterostructures. This excellent performance of the device originates from the high interface quality, large built-in electric field, Fowler-Nordheim tunneling (FNT) of charge transport, and enhancing light absorption at the heterostructures. Moreover, the detector exhibits a low noise power density below 10-22 A2·Hz-1 and a high cutoff frequency of 5 kHz, enabling it to maintain high-contrast real-time reflection imaging capability under solar illumination.

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来源期刊

Advanced Materials 工程技术-材料科学：综合

CiteScore

43.00

自引率

4.10%

发文量

2182

审稿时长

2 months

期刊介绍： Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.