氟掺杂阴离子亚晶格工程提高低温固体氧化物电化学电池δ - Bi2O3稳定性(Small 41/2025)

IF 12.1 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Small Pub Date : 2025-10-16 DOI:10.1002/smll.70738
Donghun Lee, Hyunseung Kim, Seung Jin Jeong, Hyeongmin Yu, Incheol Jeong, WooChul Jung, Kang Taek Lee
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引用次数: 0

摘要

固体氧化物电化学电池在文章编号2503922中,Incheol Jeong, WooChul Jung, Kang Taek Lee及其同事发表了通过F−掺杂稳定δ- bi2o3基氧离子导体的突破性发现。在较低温度下,通过掺入F−调节阴离子亚晶格可以有效抑制δ-Bi2O3的相不稳定性,从而保持其超离子导电性。此外,将掺F−的Bi2O3应用于固体氧化物电化学电池中,使其高效稳定地运行。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Anion Sublattice Engineering via Fluorine Doping to Enhance δ-Bi2O3 Stability for Low-Temperature Solid Oxide Electrochemical Cells (Small 41/2025)

Anion Sublattice Engineering via Fluorine Doping to Enhance δ-Bi2O3 Stability for Low-Temperature Solid Oxide Electrochemical Cells (Small 41/2025)

Solid Oxide Electrochemical Cells

In article number 2503922, Incheol Jeong, WooChul Jung, Kang Taek Lee, and co-workers present the groundbreaking discovery to stabilize δ-Bi2O3-based oxygen ionic conductors via F doping. The phase instability of δ-Bi2O3 was effectively suppressed at lower temperatures by modulating the anion sublattice through F incorporation, thereby retaining its superionic conductivity. Furthermore, F-doped Bi2O3 was applied to solid oxide electrochemical cells, enabling highly efficient and stable operation.

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来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
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