通过异质外延在异常生长的Ag模板上,显著提高了Cu2O薄膜的结晶度

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Peisen Liu, Jiangyiming Jiang, Yun Tian
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引用次数: 0

摘要

氧化亚铜(Cu2O)因其无毒、加工成本低、理论功率转换效率高而成为薄膜异质结太阳能电池中很有前途的p型吸收剂。然而,传统的合成方法产生的Cu2O薄膜具有小晶粒和众多的晶界,作为电荷重组中心,严重限制了器件的性能。扩大晶粒的策略需要高温工艺(>600°C),这增加了生产成本,或者需要在非导电衬底上进行复杂的Cu2O薄膜外延生长。在这项工作中,使用异常生长的大颗粒Ag薄膜作为Cu2O薄膜外延生长的模板。在Ag模板上外延沉积的Cu2O薄膜可以获得大到~ 10 μm的晶粒尺寸。结果表明,在Cu2O/Ag界面处形成的成分过渡缓冲层减少了晶格失配,有利于外延。外延生长的Cu2O薄膜的光致发光光谱(PL)显示出极高的近带边发光强度,表明在Ag模板上外延生长的Cu2O薄膜的结晶度显著提高。本研究表明,在异常生长的Ag模板上外延生长Cu2O薄膜是一种有效的方法,可以在低热收支的情况下提高Cu2O薄膜的结晶度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Significantly improved crystallinity in Cu2O films enabled by heteroepitaxy on abnormally-grown Ag templates
Cuprous oxide (Cu2O) is a promising p-type absorber in thin film heterojunction solar cells due to its non-toxic, low-cost processing and high theoretical power conversion efficiency (PCE). However, conventional synthesis methods yield Cu2O films with small grains and numerous grain boundaries that act as charge recombination centers, severely limiting device performance. Strategies to enlarge grains require high-temperature processes (>600 °C) with increased production costs, or involve complex epitaxial growth of Cu2O films on non-conductive substrates. In this work, abnormally-grown Ag films with large grains were used as the templates for epitaxial growth of Cu2O films. Grain size as large as ∼10 μm can be obtained in Cu2O films epitaxially deposited on Ag templates. It is revealed that a composition-transition buffer layer formed at the Cu2O/Ag interface reduces lattice mismatch and facilitates epitaxy. The photoluminescence spectra (PL) of epitaxially grown Cu2O films showed extremely high near band-edge luminescence intensity, demonstrating the significantly improved crystallinity for epitaxially grown Cu2O films on Ag templates. This work suggests that epitaxial growth of Cu2O films on abnormally-grown Ag templates is an effective method to improve the crystallinity of Cu2O thin films with a low thermal budget.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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