Shangwen Xia , Jianwen Wu , Jingyi Lin , Ruang Chen , Yuan Jiang
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引用次数: 0
摘要
中频真空开关的断路能力受触点开启速度和金属蒸气密度的影响较大。然而,对它们相互作用机制的系统实验验证仍然有限。在本研究中,开发了专用的中频引弧平台,并在4-14 kA RMS下进行了三种不同开启速度下的中断实验。建立了瞬态数值模型,计算了电流零点处的金属蒸气密度。在实验测量和数值模拟的基础上,定量分析了CZP处金属蒸汽密度与开启速度和频率的关系,并提出了保证中频系统安全中断的临界开启速度配置。利用临界蒸汽密度准则构建了开启速度、电流和频率分布图,计算的安全裕度与实验结果吻合较好。对于直径为20mm的CuCr25平触点,对于10 kA RMS中断,所需速度从360 Hz时的0.44 m/s增加到800 Hz时的约2.20 m/s。本研究确定了开启速度通过控制金属蒸气密度来控制中断性能,从而为接触速度设计提供了预测框架,并为优化航空中频真空开关提供了定量基础。
Influence of opening velocity on interruption capacity of intermediate-frequency vacuum switches with consideration of metal vapor density
The interruption capacity of intermediate-frequency (IF) vacuum switches is significantly affected by contact opening velocity and metal vapor density. However, systematic experimental validation of their interaction mechanisms remains limited. In this study, a dedicated IF drawn-arc platform is developed, and interruption experiments are conducted at 4–14 kA RMS under three distinct opening speeds. A transient numerical model is established to compute the metal vapor density at the current zero point (CZP). Based on experimental measurements and numerical modeling, the metal vapor density at CZP is quantitatively analyzes as a function of opening speed and frequency, and critical opening speed configurations are proposed to ensure safe interruption in IF systems. A map of opening speed, current, and frequency was constructed using the critical vapor density criterion, and the calculated safety margins were in good agreement with experimental results. For a 20 mm diameter CuCr25 flat contact, the required speed increases from 0.44 m/s at 360 Hz to approximately 2.20 m/s at 800 Hz for 10 kA RMS interruption. This study establishes that opening velocity governs interruption performance by controlling metal vapor density, thereby providing both a predictive framework for contact velocity design and a quantitative basis for optimizing aviation IF vacuum switches.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.