利用不同剥离技术合成二维碲纳米片的紫外发射

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Swathi V. M., Aji A. Anappara
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引用次数: 0

摘要

我们报道了碲纳米片(TeNS)通过三种不同的自上而下剥离方法,探针超声,低温辅助合成和剪切诱导压裂,可重复合成紫外(UV)光致发光(PL)发射。尽管合成工艺不同,但所有方法都能产生具有一致结构完整性的少层厚度(0.6-6.4 nm)的TeNS,并且具有以340 nm (3.65 eV)为中心的突出紫外发射。系统的光学表征揭示了从p键三重态到p反键三重态的转变,表现为~ 230 ~ 240 nm (5.16 ~ 5.39 eV)和~ 270 ~ 280 nm (4.43 ~ 4.60 eV)附近的两个特征吸收峰。XRD和Raman研究证实了TeNS的晶体特征,而FTIR光谱显示了表面/边缘羟基化,这增强了它们在水介质中的分散稳定性。紫外发射的重现性与方法无关,可归因于受羟基功能化影响的表面状态,而不是由TeNS的固有带隙引起的。这些发现表明溶液处理的TeNS作为UV发射器具有光电应用的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultraviolet emission from 2D tellurium nanosheets synthesised using diverse exfoliation techniques

We report the reproducible synthesis of ultraviolet (UV) photoluminescence (PL) emission from tellurium nanosheets (TeNS) through three distinct top-down exfoliation methods, probe sonication, cryo-assisted synthesis and shear-induced fracturing. Despite differing synthesis processes, all approaches yield few-layer thick (0.6–6.4 nm) TeNS with consistent structural integrity and prominent UV emission centred at 340 nm (3.65 eV). Systematic optical characterisation reveals transitions from p-bonding triplets to p-antibonding triplets, manifested as two characteristic absorption peaks around ~ 230–240 nm (5.16–5.39 eV) and ~ 270–280 nm (4.43–4.60 eV). XRD and Raman studies confirm the crystalline features of TeNS, while FTIR spectra indicate surface/ edge hydroxylation, which enhances their dispersion stability in an aqueous medium. The method-independent reproducibility of UV emission can be attributed to the surface states influenced by hydroxyl functionalisation rather than arising from the intrinsic bandgap of TeNS. These findings suggest solution-processed TeNS as UV emitters with potential for optoelectronic applications.

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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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