低温和信号限制条件下原子分辨率光谱作图的直接电子探测。

IF 2.2 3区 工程技术 Q1 MICROSCOPY
Berit H Goodge, Lena F Kourkoutis
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引用次数: 0

摘要

STEM-EELS将光谱映射扩展到低温,为许多领域的新实验打开了大门,包括材料物理、生物系统和固液界面。然而,由于样品灵敏度或采集时间的限制,此类实验经常面临信号限制。与传统的间接探测系统(如电荷耦合器件(ccd))相比,直接电子探测器(ded)具有更高的探测量子效率、更窄的点扩展函数和更优越的信噪比。在这里,Gatan K2 Summit DED的性能与Gatan UltraScan 1000 CCD进行了比较,用于信号受限的EELS实验。由于改进了DED的点扩展函数,在色散降低5倍的情况下,能量分辨率仍然与CCD相当,同时提供更宽的总能量范围。此外,DED的优点使各种低信号实验成为可能,包括小边和高能边的快速原子分辨率映射。对于较低的每像素停留时间,直接检测获得的元素图与CCD获得的元素图相比,具有较低的采集死区时间,显示出更高的原子柱对比度。利用这些性能改进和快速的每帧读出时间,我们展示了EELS在低温下的原子分辨率元素映射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct electron detection for atomic-resolution spectroscopic mapping under cryogenic and signal-limited conditions.

The expansion of spectroscopic mapping by STEM-EELS to cryogenic temperatures opens the door to new experiments across many fields including materials physics, biological systems, and solid-liquid interfaces. Such experiments, however, often face signal limitations due to sample sensitivity or acquisition time. Compared to traditional indirect detection systems such as charge coupled devices (CCDs), direct electron detectors (DEDs) offer improved detective quantum efficiency, narrower point spread function, and superior signal to noise ratio. Here, the performance of a Gatan K2 Summit DED is compared to a Gatan UltraScan 1000 CCD for use in signal-limited EELS experiments. Due to improved point spread function of the DED, energy resolution remains comparable to the CCD at 5 times lower dispersion, providing simultaneous access to a much broader total energy range. Furthermore, the benefits of DED enable a variety of low-signal experiments, including rapid atomic-resolution mapping of minor and high energy edges. For low per-pixel dwell time, elemental maps acquired by direct detection show increased atomic column contrast compared to those acquired with the CCD with lower acquisition dead time. Taking advantage of these performance improvements and the rapid per frame readout time, we demonstrate EELS atomic-resolution elemental mapping at cryogenic temperatures.

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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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