螺旋主导的混合位错阵列促进了LPCVD TiAlN涂层的螺旋生长

IF 6.1 2区 材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS
Jun Qu , Shequan Wang , Wei Lai , Jie Zhu , Xiaoyuan Ye , Xinfu Gu , Zhiyang Yu
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引用次数: 0

摘要

通过低压化学气相沉积(LPCVD)技术合成的具有自组装纳米层状结构的TiAlN涂层代表了高性能切削工具的领先材料体系。虽然它们的分层结构已经被广泛探索,但相关晶体缺陷的性质和进化-特别是位错-仍然没有得到充分的了解。在这项工作中,使用多尺度电子显微镜对聚焦离子束(FIB)铣削制备的横截面和平面TEM样品进行了系统的研究,研究了< 111 >织构的柱状TiAlN晶粒中的位错形态。高密度(~ 1015 m−2)位错阵列几乎垂直于片层,在横截面样品中一致观察到并表现出对称的羽毛状对比。这些长(~ 200 nm)的直线位错被确定为混合完全位错,其Burgers向量为b =½< 110 >。这些位错起源于三层锥体脊,沿着与它们的伯格矢量紧密对齐的方向在晶粒中传播,表明了一个主要的螺旋分量。原子分辨率HAADF成像显示的螺旋特征进一步证实了这一点。这些发现支持位错辅助生长机制,其中螺杆组件作为持久的原子步长源,促进晶粒沿< 001 >三个方向垂直生长,从而增强了观察到的< 111 >织构。这种位错介导的生长机制为LPCVD TiAlN涂层中缺陷与微观结构的相互作用提供了新的见解,并为高性能CVD涂层的微观结构设计提供了指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Screw-dominated mixed dislocation arrays promote spiral growth in LPCVD TiAlN coatings
TiAlN coatings with self-assembled nanolamellar structures, synthesized via low-pressure chemical vapor deposition (LPCVD), represent a leading material system for high-performance cutting tools. While their layered architecture has been explored extensively, the nature and evolution of associated crystal defects—particularly dislocations—remain insufficiently understood. In this work, dislocation morphologies within 〈111〉-textured columnar TiAlN grains were systematically investigated using multi-scale electron microscopy on cross-sectional and plane-view TEM specimens prepared by focused ion beam (FIB) milling. High-density (∼1015 m−2) dislocation arrays, nearly perpendicular to the lamellae, were consistently observed and exhibited symmetric feather-like contrast in the cross-sectional samples. These long (∼200 nm), straight dislocations were identified as mixed full dislocations with Burgers vectors of b = ½ 〈110〉. Originating from three-fold pyramidal ridges, these dislocations propagate through grains along directions closely aligned with their Burgers vectors, indicating a dominant screw component. This was further validated by spiral features revealed through atomic resolution HAADF imaging. These findings support a dislocation-assisted growth mechanism, in which the screw components act as persistent atomic step sources that facilitate vertical grain growth along three 〈001〉 directions, thereby reinforcing the observed 〈111〉 texture. This dislocation-mediated growth mechanism provides new insights into the defect-microstructure interplay in LPCVD TiAlN coatings and offers guidance for the microstructural design of high-performance CVD coatings.
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来源期刊
Surface & Coatings Technology
Surface & Coatings Technology 工程技术-材料科学:膜
CiteScore
10.00
自引率
11.10%
发文量
921
审稿时长
19 days
期刊介绍: Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.
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