{"title":"W/Mg共掺杂VO2薄膜的转变温度、光学性能和结构性能得到改善","authors":"H. F. Haji, M. E. Samiji, N. R. Mlyuka","doi":"10.1007/s10854-025-15832-6","DOIUrl":null,"url":null,"abstract":"<div><p>W/Mg co-doped VO<sub>2</sub> thin films were prepared by co-sputtering of magnesium, tungsten, and vanadium (V(99%)W(1%) alloy targets at a substrate temperature of 425 °C. The films were characterized by X-ray diffraction, atomic force microscopy, Rutherford backscattering spectroscopy, the two-point probe, and UV/VIS/NIR Spectrometer. W/Mg co-doped VO<sub>2</sub> films with concentrations of~0.95 at.% and~3.1 at.% for W and Mg, respectively, showed relatively lower crystallite sizes and reduced hysteresis loop widths of 3.9 nm and~2 °C compared to 11.4 nm and 17.8 °C, respectively, for pristine VO<sub>2</sub>. The integrated luminous transmittance of the co-doped samples was~47%, compared to 26% and 41% for the W-doped and pristine VO<sub>2</sub> films, respectively. A significant reduction in transition temperature to below 33 °C was realized for the co-doped films, compared to 64.8 °C and 44 °C for the undoped and W-doped VO<sub>2</sub>-based thin films, respectively. This work shows that a controlled amount of Mg in the W-doped VO<sub>2</sub> films could potentially make VO<sub>2</sub> thin films useful for smart window applications.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 28","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"W/Mg co-doped VO2 thin films with improved transition temperature, optical, and structural properties\",\"authors\":\"H. F. Haji, M. E. Samiji, N. R. Mlyuka\",\"doi\":\"10.1007/s10854-025-15832-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>W/Mg co-doped VO<sub>2</sub> thin films were prepared by co-sputtering of magnesium, tungsten, and vanadium (V(99%)W(1%) alloy targets at a substrate temperature of 425 °C. The films were characterized by X-ray diffraction, atomic force microscopy, Rutherford backscattering spectroscopy, the two-point probe, and UV/VIS/NIR Spectrometer. W/Mg co-doped VO<sub>2</sub> films with concentrations of~0.95 at.% and~3.1 at.% for W and Mg, respectively, showed relatively lower crystallite sizes and reduced hysteresis loop widths of 3.9 nm and~2 °C compared to 11.4 nm and 17.8 °C, respectively, for pristine VO<sub>2</sub>. The integrated luminous transmittance of the co-doped samples was~47%, compared to 26% and 41% for the W-doped and pristine VO<sub>2</sub> films, respectively. A significant reduction in transition temperature to below 33 °C was realized for the co-doped films, compared to 64.8 °C and 44 °C for the undoped and W-doped VO<sub>2</sub>-based thin films, respectively. This work shows that a controlled amount of Mg in the W-doped VO<sub>2</sub> films could potentially make VO<sub>2</sub> thin films useful for smart window applications.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 28\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-10-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-025-15832-6\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-15832-6","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
W/Mg co-doped VO2 thin films with improved transition temperature, optical, and structural properties
W/Mg co-doped VO2 thin films were prepared by co-sputtering of magnesium, tungsten, and vanadium (V(99%)W(1%) alloy targets at a substrate temperature of 425 °C. The films were characterized by X-ray diffraction, atomic force microscopy, Rutherford backscattering spectroscopy, the two-point probe, and UV/VIS/NIR Spectrometer. W/Mg co-doped VO2 films with concentrations of~0.95 at.% and~3.1 at.% for W and Mg, respectively, showed relatively lower crystallite sizes and reduced hysteresis loop widths of 3.9 nm and~2 °C compared to 11.4 nm and 17.8 °C, respectively, for pristine VO2. The integrated luminous transmittance of the co-doped samples was~47%, compared to 26% and 41% for the W-doped and pristine VO2 films, respectively. A significant reduction in transition temperature to below 33 °C was realized for the co-doped films, compared to 64.8 °C and 44 °C for the undoped and W-doped VO2-based thin films, respectively. This work shows that a controlled amount of Mg in the W-doped VO2 films could potentially make VO2 thin films useful for smart window applications.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.