具有准类型-Ι带对准的石墨烯/PbTe/n-Si异质结光电探测器实现宽带和偏置可调光响应。

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Lixin Liu,Jiayue Han,Jun Gou,Guangxu Mao,Hang Yu,Han Dou,Yunlu Lian,Jinling Xie,Jiamin Jiang,Baohua An,Lei Guo,Hongxi Zhou,Chao Chen,Yadong Jiang,He Yu,Jun Wang
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引用次数: 0

摘要

传统的基于III-V和II-VI半导体的高性能宽带光电探测器,尽管在近红外和中红外区域取得了商业成功,但其制造成本高,CMOS兼容性差,需要低温冷却,从而限制了其大规模集成。在这里,我们展示了一种通过磁控溅射制造的虚拟石墨烯/PbTe/Si异质结光电探测器,为高性能光电器件提供了可扩展和经济高效的途径。该器件表现出由PbTe/Si界面上的量子隧穿控制的偏置可调光响应。在±3v偏置下,低光强下的光电流相差近2个数量级,而在高光强下则观察到小于5%的对称响应。利用这种非线性响应,我们建立了一种双模光通信方案,在高强度下传输明文,在低强度下生成加密的反码。这种内置的编码功能可以实现简单而有效的安全光通信策略,而无需复杂的外部电路。此外,cmos兼容的制造工艺确保了与现有硅光子平台的无缝集成,突出了这种方法在未来大规模片上光通信技术中的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Graphene/PbTe/n-Si Heterojunction Photodetector with Quasi-Type-Ι Band Alignment Enables a Broadband and Bias-Tunable Photoresponse.
High-performance broadband photodetectors traditionally based on III-V and II-VI semiconductors, despite their commercial success in the near- and mid-infrared regions, suffer from high fabrication cost, poor CMOS compatibility, and the need for cryogenic cooling, thus limiting their large-scale integration. Here, we demonstrate a virtual graphene/PbTe/Si heterojunction photodetector fabricated by magnetron sputtering, offering a scalable and cost-effective route to high-performance optoelectronic devices. The device exhibits a bias-tunable photoresponse governed by quantum tunneling at the PbTe/Si interface. At ±3 V biases, the photocurrent differs by nearly 2 orders of magnitude under low light intensities, whereas a symmetric response with less than 5% variation is observed at high light intensities. Exploiting this nonlinear response, we establish a dual-mode optical communication scheme, where plaintext is transmitted at high intensities and encrypted inverse codes are generated under low intensities. This built-in encoding functionality enables a simple yet effective strategy for secure optical communication without complex external circuits. Moreover, the CMOS-compatible fabrication process ensures seamless integration with existing silicon photonic platforms, highlighting the potential of this approach for future large-scale on-chip optical communication technologies.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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