利用聚焦离子束扫描电子显微镜进行原位微尺度冷焊。

IF 2.2 3区 工程技术 Q1 MICROSCOPY
Ambra Celotto , Randi Holmestad , Filippo Berto , Per Erik Vullum
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引用次数: 0

摘要

微尺度冷焊是实现高质量接头的有效方法,特别是在电子元件中,因为它的低温过程保留了贱金属的机械和电气性能。然而,对异种金属连接成功键合机制的基本理解有限,极大地限制了其工业应用。在微观尺度上尤其如此,热辅助方法仍然是普遍首选。因此,本工作提出了一种在微尺度下异种金属冷焊的试验平台程序。聚焦离子束(FIB)扫描电子显微镜用于设计、监测和表征该技术,可以完全控制焊接参数,如速度、几何形状和表面氧化物。通过将锥形铜线推入软铝合金的预制孔中,无需预先进行表面处理即可实现成功的粘合。铜线直径大于孔径,增大了剪切应力和塑性变形。节理的截面分析显示,在结合界面附近存在严重的晶粒细化。元素映射强调,一旦接触开始,剪切力就会机械地去除大多数污染物。结合缺陷源于FIB中氧化物或污染物的微观残留,而在没有它们的情况下观察到一个均匀的界面。测试了一种用于原位测量Al-Cu界面电阻的四探针装置,并间接用于验证键合质量。透射电镜研究表明,即使存在纳米级的破碎氧层,在接合界面上也发生了相互扩散,形成了薄的金属间Al-Cu层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
In-situ microscale cold welding using a focused ion beam-scanning electron microscope
Microscale cold welding is an efficient method for achieving high-quality joints, particularly in electronic components, as its low-temperature process preserves the mechanical and electrical properties of the base metals. However, the limited fundamental understanding of successful bonding mechanisms for dissimilar metal joining has significantly restricted its industrial adoption. This is especially true at the microscale, where heat-assisted methods are still generally preferred. Therefore, this work presents a test bed procedure for cold welding of dissimilar metals at the microscale. A Focused Ion Beam (FIB) -scanning electron microscope was employed to design, monitor and characterise the technique, allowing complete control over the welding parameters, such as speed, geometry, and superficial oxides. Successful bonding was achieved without preliminary surface preparation by pushing a tapered copper wire into a pre-made hole in a soft aluminium alloy. The copper wire diameter was larger than that of the hole, promoting shear stresses and plastic deformation. Cross-sectional analysis of joints revealed severe grain refinement near the bonded interface. Elemental mapping highlighted that shear forces removed most contaminants mechanically as soon as contact began. Bonding defects originated from microscopic residuals of oxides or contaminants from the FIB, while a uniform interface was observed in their absence. A four-probe setup for in-situ electrical resistance measurement across the Al-Cu interface was tested, and it was indirectly used to testify the bond quality. Transmission electron microscopy investigations revealed that interdiffusion occurred across the joint interface, forming a thin intermetallic Al-Cu layer, even in the presence of a nanoscopic fragmented oxygen layer.
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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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