{"title":"具有增强介电和储能性能的无铅ba0.85 sr0.15 tio3薄膜电容器的溶胶-凝胶合成和表征","authors":"A. Selmi, A. E. Maayoufi, F. Jomni, J.-C. Carru","doi":"10.1007/s10854-025-15881-x","DOIUrl":null,"url":null,"abstract":"<div><p>Lead-free Ba<sub>0.85</sub>Sr<sub>0.15</sub>TiO<sub>3</sub> (BST) thin films ranging in thicknesses from 50 to 600 nm were deposited on platinized silicon (Pt/SiO<sub>2</sub>/Si) substrates using a spin-coating technique, successfully creating Au/BST/Pt thin capacitors. X-ray diffraction and scanning electron microscopy revealed that the BST films were crack-free, dense, and crystallized with a polycrystalline tetragonal perovskite structure. The thickness-dependent dielectric, leakage current, ferroelectric, and energy storage properties of Ba<sub>0.85</sub>Sr<sub>0.15</sub>TiO<sub>3</sub> were analyzed at room temperature. As the BST film thickness increased from 50 to 600 nm, the dielectric permittivity of films also increased from about 40 to over 320, caused by the interfacial dead layers between films and electrodes. In contrast, both the leakage current density and the dielectric losses decreased with increasing film thickness. The figure of merit shows a remarkable enhancement from 7 to 38 with the increase in thickness from 50 to 600 nm. Experimental results indicated that increases in dielectric permittivity and tunability are consistently linked to a low dielectric loss, which practically enhances the figure of merit. Additionally, the study of energy storage performance across different films revealed high and promising values for both efficiency and recoverable energy density. The highest efficiency, 70%, was achieved with a 400 nm film, which also exhibited a significant energy storage density of 7 J/cm<sup>3</sup>. These BST thin films thus show great potential as materials for manufacturing electrostatic capacitors for electrical energy storage.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 28","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Sol–gel synthesis and characterization of lead-free Ba0.85Sr0.15TiO3-based thin-film capacitors with enhanced dielectric and energy storage performance\",\"authors\":\"A. Selmi, A. E. Maayoufi, F. Jomni, J.-C. Carru\",\"doi\":\"10.1007/s10854-025-15881-x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Lead-free Ba<sub>0.85</sub>Sr<sub>0.15</sub>TiO<sub>3</sub> (BST) thin films ranging in thicknesses from 50 to 600 nm were deposited on platinized silicon (Pt/SiO<sub>2</sub>/Si) substrates using a spin-coating technique, successfully creating Au/BST/Pt thin capacitors. X-ray diffraction and scanning electron microscopy revealed that the BST films were crack-free, dense, and crystallized with a polycrystalline tetragonal perovskite structure. The thickness-dependent dielectric, leakage current, ferroelectric, and energy storage properties of Ba<sub>0.85</sub>Sr<sub>0.15</sub>TiO<sub>3</sub> were analyzed at room temperature. As the BST film thickness increased from 50 to 600 nm, the dielectric permittivity of films also increased from about 40 to over 320, caused by the interfacial dead layers between films and electrodes. In contrast, both the leakage current density and the dielectric losses decreased with increasing film thickness. The figure of merit shows a remarkable enhancement from 7 to 38 with the increase in thickness from 50 to 600 nm. Experimental results indicated that increases in dielectric permittivity and tunability are consistently linked to a low dielectric loss, which practically enhances the figure of merit. Additionally, the study of energy storage performance across different films revealed high and promising values for both efficiency and recoverable energy density. The highest efficiency, 70%, was achieved with a 400 nm film, which also exhibited a significant energy storage density of 7 J/cm<sup>3</sup>. These BST thin films thus show great potential as materials for manufacturing electrostatic capacitors for electrical energy storage.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 28\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-025-15881-x\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-15881-x","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Sol–gel synthesis and characterization of lead-free Ba0.85Sr0.15TiO3-based thin-film capacitors with enhanced dielectric and energy storage performance
Lead-free Ba0.85Sr0.15TiO3 (BST) thin films ranging in thicknesses from 50 to 600 nm were deposited on platinized silicon (Pt/SiO2/Si) substrates using a spin-coating technique, successfully creating Au/BST/Pt thin capacitors. X-ray diffraction and scanning electron microscopy revealed that the BST films were crack-free, dense, and crystallized with a polycrystalline tetragonal perovskite structure. The thickness-dependent dielectric, leakage current, ferroelectric, and energy storage properties of Ba0.85Sr0.15TiO3 were analyzed at room temperature. As the BST film thickness increased from 50 to 600 nm, the dielectric permittivity of films also increased from about 40 to over 320, caused by the interfacial dead layers between films and electrodes. In contrast, both the leakage current density and the dielectric losses decreased with increasing film thickness. The figure of merit shows a remarkable enhancement from 7 to 38 with the increase in thickness from 50 to 600 nm. Experimental results indicated that increases in dielectric permittivity and tunability are consistently linked to a low dielectric loss, which practically enhances the figure of merit. Additionally, the study of energy storage performance across different films revealed high and promising values for both efficiency and recoverable energy density. The highest efficiency, 70%, was achieved with a 400 nm film, which also exhibited a significant energy storage density of 7 J/cm3. These BST thin films thus show great potential as materials for manufacturing electrostatic capacitors for electrical energy storage.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.