{"title":"单晶硅纳米磨削特性及亚表面损伤形成机制研究。","authors":"Haipeng Yan, Haining Zhang, Siyuan Cao, Chao Wang","doi":"10.3390/mi16090976","DOIUrl":null,"url":null,"abstract":"<p><p>Monocrystalline silicon is an excellent semiconductor material for integrated circuits. Its surface quality has an enormous effect on its service life. The surfaces are formed by ultra-precision machining using nano-grinding, one of the technologies that can achieve surface roughness at the nano- or sub-nano-scale. Therefore, subsurface damage of monocrystalline silicon in nano-grinding was studied by establishing a molecular dynamics simulation model, and the impact of machining parameters on the force-thermal behavior was analyzed. The results reveal that the mechanism of subsurface damage is mainly structural phase transformation and amorphization. In nano-grinding of monocrystalline silicon, the tangential grinding force has a relatively major role in material removal. With increasing grinding depth and grinding speed, the grinding heat rises, and a certain degree of high temperature strengthens the toughness of the material, improving the subsurface quality of monocrystalline silicon. Therefore, subsurface damage in monocrystalline silicon can be controlled by reducing the grinding depth and increasing the grinding speed.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"16 9","pages":""},"PeriodicalIF":3.0000,"publicationDate":"2025-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12471329/pdf/","citationCount":"0","resultStr":"{\"title\":\"Study on Nano-Grinding Characteristics and Formation Mechanism of Subsurface Damage in Monocrystalline Silicon.\",\"authors\":\"Haipeng Yan, Haining Zhang, Siyuan Cao, Chao Wang\",\"doi\":\"10.3390/mi16090976\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><p>Monocrystalline silicon is an excellent semiconductor material for integrated circuits. Its surface quality has an enormous effect on its service life. The surfaces are formed by ultra-precision machining using nano-grinding, one of the technologies that can achieve surface roughness at the nano- or sub-nano-scale. Therefore, subsurface damage of monocrystalline silicon in nano-grinding was studied by establishing a molecular dynamics simulation model, and the impact of machining parameters on the force-thermal behavior was analyzed. The results reveal that the mechanism of subsurface damage is mainly structural phase transformation and amorphization. In nano-grinding of monocrystalline silicon, the tangential grinding force has a relatively major role in material removal. With increasing grinding depth and grinding speed, the grinding heat rises, and a certain degree of high temperature strengthens the toughness of the material, improving the subsurface quality of monocrystalline silicon. Therefore, subsurface damage in monocrystalline silicon can be controlled by reducing the grinding depth and increasing the grinding speed.</p>\",\"PeriodicalId\":18508,\"journal\":{\"name\":\"Micromachines\",\"volume\":\"16 9\",\"pages\":\"\"},\"PeriodicalIF\":3.0000,\"publicationDate\":\"2025-08-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12471329/pdf/\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Micromachines\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.3390/mi16090976\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, ANALYTICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micromachines","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.3390/mi16090976","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
Study on Nano-Grinding Characteristics and Formation Mechanism of Subsurface Damage in Monocrystalline Silicon.
Monocrystalline silicon is an excellent semiconductor material for integrated circuits. Its surface quality has an enormous effect on its service life. The surfaces are formed by ultra-precision machining using nano-grinding, one of the technologies that can achieve surface roughness at the nano- or sub-nano-scale. Therefore, subsurface damage of monocrystalline silicon in nano-grinding was studied by establishing a molecular dynamics simulation model, and the impact of machining parameters on the force-thermal behavior was analyzed. The results reveal that the mechanism of subsurface damage is mainly structural phase transformation and amorphization. In nano-grinding of monocrystalline silicon, the tangential grinding force has a relatively major role in material removal. With increasing grinding depth and grinding speed, the grinding heat rises, and a certain degree of high temperature strengthens the toughness of the material, improving the subsurface quality of monocrystalline silicon. Therefore, subsurface damage in monocrystalline silicon can be controlled by reducing the grinding depth and increasing the grinding speed.
期刊介绍:
Micromachines (ISSN 2072-666X) is an international, peer-reviewed open access journal which provides an advanced forum for studies related to micro-scaled machines and micromachinery. It publishes reviews, regular research papers and short communications. Our aim is to encourage scientists to publish their experimental and theoretical results in as much detail as possible. There is no restriction on the length of the papers. The full experimental details must be provided so that the results can be reproduced.