YVO4薄膜的表面形貌及光学和物理性质

IF 1 4区 化学 Q4 SPECTROSCOPY
N. A. Bosak, A. N. Chumakov, L. V. Baran, V. V. Malyutina-Bronskaya, T. F. Raichenok, A. A. Ivanov, V. V. Kiris, E. M. Dyatlova, A. A. Shevchenok, A. V. Buka, A. S. Kuzmitskaya
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引用次数: 0

摘要

利用波长为1.064 μm、功率密度为q = 64 MW/cm2的高频脉冲周期(f ~ 13 kHz)激光,在真空室压力为p = 3 Pa的条件下,在钒酸钇YVO4陶瓷上制备了纳米结构薄膜。用原子力显微镜研究了YVO4薄膜的形貌。得到了YVO4薄膜在可见光、近红外和中红外区的透射光谱。分析了YVO4/Si结构的电物理特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface Morphology and Optical and Physical Properties of YVO4 Films

Nanostructured thin films on silicon substrate were obtained by high-frequency pulse-periodic (f ~ 13 kHz) action of laser radiation with a wavelength of 1.064 μm and a power density of q = 64 MW/cm2 on yttrium vanadate YVO4 ceramics at a vacuum chamber pressure of p = 3 Pa. The morphology of thin YVO4 films was studied using atomic force microscopy. Transmittance spectra of YVO4 films were obtained in the visible, near, and mid-IR regions. The electrophysical characteristics of YVO4/Si structures were analyzed.

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来源期刊
CiteScore
1.30
自引率
14.30%
发文量
145
审稿时长
2.5 months
期刊介绍: Journal of Applied Spectroscopy reports on many key applications of spectroscopy in chemistry, physics, metallurgy, and biology. An increasing number of papers focus on the theory of lasers, as well as the tremendous potential for the practical applications of lasers in numerous fields and industries.
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