M. V. Polyakov, A. S. Rogachev, D. Yu. Kovalev, S. G. Vadchenko, D. O. Moskovskikh, F. V. Kiryukhantsev-Korneev, L. S. Volkova, A. P. Orlov
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Thin High Entropy CoCrFeNiTix Alloy Films for Resistive Elements of Microelectronics
Using the method of magnetron sputtering from a multicomponent target manufactured by hot pressing of a powder mixture, thin films of a high-entropy CoCrFeNiTix alloy on silicon substrates were first obtained. The microstructure and phase composition of these films have been studied. Resistive thin-film elements are made and their electrical resistance is measured at different temperatures. It is shown that the value of the electrical resistance of new resistive elements linearly depends on temperature with the negative temperature coefficient TCR = –4.66 × 10–5 K–1.
期刊介绍:
Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.