铝靶磁控溅射过程中等离子体形成气流中氩氮比对氮膜元素组成的影响

IF 0.5 4区物理与天体物理 Q4 MECHANICS

Doklady Physics Pub Date : 2025-07-03 DOI:10.1134/S1028335825600014

B. T. Baisova, L. V. Baranova, V. I. Strunin

{"title":"铝靶磁控溅射过程中等离子体形成气流中氩氮比对氮膜元素组成的影响","authors":"B. T. Baisova, L. V. Baranova, V. I. Strunin","doi":"10.1134/S1028335825600014","DOIUrl":null,"url":null,"abstract":"<p>The results of a study of the elemental composition of thin films of aluminum nitride from the ratio of argon and nitrogen fluxes are presented. Aluminum nitride films were obtained by magnetron sputtering of an aluminum target in an atmosphere of a mixture of gases, that is, argon and nitrogen.</p>","PeriodicalId":533,"journal":{"name":"Doklady Physics","volume":"69 10-12","pages":"104 - 107"},"PeriodicalIF":0.5000,"publicationDate":"2025-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The Dependence of the Elemental Composition of AlN Films on the Ratio of Argon and Nitrogen in a Plasma-Forming Gas Stream during Magnetron Sputtering of an Aluminum Target\",\"authors\":\"B. T. Baisova, L. V. Baranova, V. I. Strunin\",\"doi\":\"10.1134/S1028335825600014\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>The results of a study of the elemental composition of thin films of aluminum nitride from the ratio of argon and nitrogen fluxes are presented. Aluminum nitride films were obtained by magnetron sputtering of an aluminum target in an atmosphere of a mixture of gases, that is, argon and nitrogen.</p>\",\"PeriodicalId\":533,\"journal\":{\"name\":\"Doklady Physics\",\"volume\":\"69 10-12\",\"pages\":\"104 - 107\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2025-07-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Doklady Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S1028335825600014\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MECHANICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Doklady Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S1028335825600014","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MECHANICS","Score":null,"Total":0}

引用次数: 0

摘要

本文介绍了用氮、氩熔剂的比值对氮化铝薄膜的元素组成进行研究的结果。采用磁控溅射法，在氩气和氮气混合气氛中溅射铝靶材，制备了氮化铝薄膜。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

The Dependence of the Elemental Composition of AlN Films on the Ratio of Argon and Nitrogen in a Plasma-Forming Gas Stream during Magnetron Sputtering of an Aluminum Target

The results of a study of the elemental composition of thin films of aluminum nitride from the ratio of argon and nitrogen fluxes are presented. Aluminum nitride films were obtained by magnetron sputtering of an aluminum target in an atmosphere of a mixture of gases, that is, argon and nitrogen.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Doklady Physics 物理-力学

CiteScore

1.40

自引率

12.50%

发文量

审稿时长

4-8 weeks

期刊介绍： Doklady Physics is a journal that publishes new research in physics of great significance. Initially the journal was a forum of the Russian Academy of Science and published only best contributions from Russia in the form of short articles. Now the journal welcomes submissions from any country in the English or Russian language. Every manuscript must be recommended by Russian or foreign members of the Russian Academy of Sciences.