光刻叠加误差随机控制中测量标尺数量与选择的动态决策

IF 5.4 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Yangmeng Li , Huidong Zhang , Noah Graff , Roberto Dailey , Dragan Djurdjanovic
{"title":"光刻叠加误差随机控制中测量标尺数量与选择的动态决策","authors":"Yangmeng Li ,&nbsp;Huidong Zhang ,&nbsp;Noah Graff ,&nbsp;Roberto Dailey ,&nbsp;Dragan Djurdjanovic","doi":"10.1016/j.cirpj.2025.09.008","DOIUrl":null,"url":null,"abstract":"<div><div>Accurate multilayer overlay alignment in photolithography is critical for semiconductor manufacturing. It is crucial to use a limited number of measurement markers to ensure the throughput while maintaining the overlay estimation and control accuracy. This work presents a novel optimization framework for dynamically down-selecting overlay measurement markers. The framework employs a stochastic multilayer control algorithm for tractable real-time control and select an optimal subset of markers that maximize overlay error estimation accuracy. The optimal marker number is determined by maximizing an objective that balances production quality and throughput. Industrial evaluation in a 300 mm fab demonstrates substantial cost-benefit improvements over traditional Run-to-Run control, highlighting enhanced process efficiency and yield.</div></div>","PeriodicalId":56011,"journal":{"name":"CIRP Journal of Manufacturing Science and Technology","volume":"63 ","pages":"Pages 227-239"},"PeriodicalIF":5.4000,"publicationDate":"2025-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Dynamic decision-making on the number and selection of measurement markers for stochastic control of overlay errors in photolithography\",\"authors\":\"Yangmeng Li ,&nbsp;Huidong Zhang ,&nbsp;Noah Graff ,&nbsp;Roberto Dailey ,&nbsp;Dragan Djurdjanovic\",\"doi\":\"10.1016/j.cirpj.2025.09.008\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Accurate multilayer overlay alignment in photolithography is critical for semiconductor manufacturing. It is crucial to use a limited number of measurement markers to ensure the throughput while maintaining the overlay estimation and control accuracy. This work presents a novel optimization framework for dynamically down-selecting overlay measurement markers. The framework employs a stochastic multilayer control algorithm for tractable real-time control and select an optimal subset of markers that maximize overlay error estimation accuracy. The optimal marker number is determined by maximizing an objective that balances production quality and throughput. Industrial evaluation in a 300 mm fab demonstrates substantial cost-benefit improvements over traditional Run-to-Run control, highlighting enhanced process efficiency and yield.</div></div>\",\"PeriodicalId\":56011,\"journal\":{\"name\":\"CIRP Journal of Manufacturing Science and Technology\",\"volume\":\"63 \",\"pages\":\"Pages 227-239\"},\"PeriodicalIF\":5.4000,\"publicationDate\":\"2025-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CIRP Journal of Manufacturing Science and Technology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1755581725001622\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, MANUFACTURING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CIRP Journal of Manufacturing Science and Technology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1755581725001622","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0

摘要

在光刻技术中,精确的多层叠加排列对半导体制造至关重要。使用有限数量的测量标记来确保吞吐量,同时保持覆盖估计和控制精度是至关重要的。本文提出了一种新的动态下选择叠加测量标记的优化框架。该框架采用随机多层控制算法进行可处理的实时控制,并选择最优标记子集,使覆盖误差估计精度最大化。最优标记数量是通过最大化平衡生产质量和吞吐量的目标来确定的。300 mm晶圆厂的工业评估表明,与传统的运行到运行控制相比,成本效益有了实质性的改善,突出了工艺效率和产量的提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dynamic decision-making on the number and selection of measurement markers for stochastic control of overlay errors in photolithography
Accurate multilayer overlay alignment in photolithography is critical for semiconductor manufacturing. It is crucial to use a limited number of measurement markers to ensure the throughput while maintaining the overlay estimation and control accuracy. This work presents a novel optimization framework for dynamically down-selecting overlay measurement markers. The framework employs a stochastic multilayer control algorithm for tractable real-time control and select an optimal subset of markers that maximize overlay error estimation accuracy. The optimal marker number is determined by maximizing an objective that balances production quality and throughput. Industrial evaluation in a 300 mm fab demonstrates substantial cost-benefit improvements over traditional Run-to-Run control, highlighting enhanced process efficiency and yield.
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来源期刊
CIRP Journal of Manufacturing Science and Technology
CIRP Journal of Manufacturing Science and Technology Engineering-Industrial and Manufacturing Engineering
CiteScore
9.10
自引率
6.20%
发文量
166
审稿时长
63 days
期刊介绍: The CIRP Journal of Manufacturing Science and Technology (CIRP-JMST) publishes fundamental papers on manufacturing processes, production equipment and automation, product design, manufacturing systems and production organisations up to the level of the production networks, including all the related technical, human and economic factors. Preference is given to contributions describing research results whose feasibility has been demonstrated either in a laboratory or in the industrial praxis. Case studies and review papers on specific issues in manufacturing science and technology are equally encouraged.
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