在UV/H2O2氧化过程中,亚硝酸盐和卤化物加剧了硝化副产物的形成

IF 4.7 3区 化学 Q2 CHEMISTRY, PHYSICAL
Hailing Chu , Teng Zhang , Peizeng Yang , Yuefei Ji , Jing Chen , Deyang Kong , Junhe Lu
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引用次数: 0

摘要

紫外线活化过氧化氢(UV/H2O2)氧化工艺已被认为是一种有效且环保的废水处理方法。然而,本研究表明,在UV/H2O2体系中,亚硝酸盐(NO2−)的存在会导致有害的硝化副产物的产生。卤化物的存在,如溴(Br−),进一步促进了它们的形成。Br−可以与•OH相互作用产生溴自由基和游离溴。这些活性溴不会被H2O2还原,而是可以迅速与NO2 -结合,生成硝基溴(BrNO2)。随后,天然有机物(NOM)可以被BrNO2攻击,产生硝化副产物。当Br−和NO2−(浓度均为200 μM)共存时,在含5 mg /L NOM的UV/H2O2体系中,4 h硝化副产物的产率达到0.902 μM。与Br−相比,碘化物(I−)存在时,硝化副产物的产率更高,而氯化物(Cl−)的影响较小。这可以归因于自由卤素物种(HOX)的氧化还原电位,这与它们被H2O2还原的可能性呈正相关。这些发现增强了对UV/H2O2氧化过程中卤化物和NO2 -之间相互作用的理解,强调了将该技术应用于含有卤化物和NO2 -的水的硝化产物的潜在风险
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Nitrite and halides exacerbate the formation of nitrated byproducts during UV/H2O2 oxidation

Nitrite and halides exacerbate the formation of nitrated byproducts during UV/H2O2 oxidation
The UV activated hydrogen peroxide (UV/H2O2) oxidation process has been recognized as an effective and environmentally friendly approach for wastewater treatment. However, this study reveals that the existence of nitrite (NO2) can result in the generation of harmful nitrated byproducts in the UV/H2O2 system. The presence of halides, such as bromide (Br), further enhances their formation. Br can interact with •OH to produce bromine radicals and free bromine. Instead of being reduced back by H2O2, these reactive bromine species can rapidly combine with NO2, yielding nitryl bromide (BrNO2). Subsequently, natural organic matter (NOM) can be attacked by BrNO2, yielding nitrated byproducts. The yield of nitrated byproducts reached 0.902 μM in 4 h when Br and NO2 (both at 200 μM) coexisted in the UV/H2O2 system containing 5 mgC/L NOM. Compared to Br, even higher nitrated byproducts formation was observed in the presence of iodide (I), whereas the influence of chloride (Cl) was less significant. This can be attributed to the redox potential of free halogen species (HOX), which positively correlates to their likelihood of being reduced by H2O2. These findings enhance the understanding of the interplay between halides and NO2 in the UV/H2O2 oxidation process, highlighting potential risks of nitrated products associated with the application of this technology to water containing halides and NO2
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来源期刊
CiteScore
7.90
自引率
7.00%
发文量
580
审稿时长
48 days
期刊介绍: JPPA publishes the results of fundamental studies on all aspects of chemical phenomena induced by interactions between light and molecules/matter of all kinds. All systems capable of being described at the molecular or integrated multimolecular level are appropriate for the journal. This includes all molecular chemical species as well as biomolecular, supramolecular, polymer and other macromolecular systems, as well as solid state photochemistry. In addition, the journal publishes studies of semiconductor and other photoactive organic and inorganic materials, photocatalysis (organic, inorganic, supramolecular and superconductor). The scope includes condensed and gas phase photochemistry, as well as synchrotron radiation chemistry. A broad range of processes and techniques in photochemistry are covered such as light induced energy, electron and proton transfer; nonlinear photochemical behavior; mechanistic investigation of photochemical reactions and identification of the products of photochemical reactions; quantum yield determinations and measurements of rate constants for primary and secondary photochemical processes; steady-state and time-resolved emission, ultrafast spectroscopic methods, single molecule spectroscopy, time resolved X-ray diffraction, luminescence microscopy, and scattering spectroscopy applied to photochemistry. Papers in emerging and applied areas such as luminescent sensors, electroluminescence, solar energy conversion, atmospheric photochemistry, environmental remediation, and related photocatalytic chemistry are also welcome.
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