Hailing Chu , Teng Zhang , Peizeng Yang , Yuefei Ji , Jing Chen , Deyang Kong , Junhe Lu
{"title":"在UV/H2O2氧化过程中,亚硝酸盐和卤化物加剧了硝化副产物的形成","authors":"Hailing Chu , Teng Zhang , Peizeng Yang , Yuefei Ji , Jing Chen , Deyang Kong , Junhe Lu","doi":"10.1016/j.jphotochem.2025.116797","DOIUrl":null,"url":null,"abstract":"<div><div>The UV activated hydrogen peroxide (UV/H<sub>2</sub>O<sub>2</sub>) oxidation process has been recognized as an effective and environmentally friendly approach for wastewater treatment. However, this study reveals that the existence of nitrite (NO<sub>2</sub><sup>−</sup>) can result in the generation of harmful nitrated byproducts in the UV/H<sub>2</sub>O<sub>2</sub> system. The presence of halides, such as bromide (Br<sup>−</sup>), further enhances their formation. Br<sup>−</sup> can interact with •OH to produce bromine radicals and free bromine. Instead of being reduced back by H<sub>2</sub>O<sub>2</sub>, these reactive bromine species can rapidly combine with NO<sub>2</sub><sup>−</sup>, yielding nitryl bromide (BrNO<sub>2</sub>). Subsequently, natural organic matter (NOM) can be attacked by BrNO<sub>2</sub>, yielding nitrated byproducts. The yield of nitrated byproducts reached 0.902 μM in 4 h when Br<sup>−</sup> and NO<sub>2</sub><sup>−</sup> (both at 200 μM) coexisted in the UV/H<sub>2</sub>O<sub>2</sub> system containing 5 mg<sub>C</sub>/L NOM. Compared to Br<sup>−</sup>, even higher nitrated byproducts formation was observed in the presence of iodide (I<sup>−</sup>), whereas the influence of chloride (Cl<sup>−</sup>) was less significant. This can be attributed to the redox potential of free halogen species (HOX), which positively correlates to their likelihood of being reduced by H<sub>2</sub>O<sub>2</sub>. These findings enhance the understanding of the interplay between halides and NO<sub>2</sub><sup>−</sup> in the UV/H<sub>2</sub>O<sub>2</sub> oxidation process, highlighting potential risks of nitrated products associated with the application of this technology to water containing halides and NO<sub>2</sub><sup>−</sup></div></div>","PeriodicalId":16782,"journal":{"name":"Journal of Photochemistry and Photobiology A-chemistry","volume":"472 ","pages":"Article 116797"},"PeriodicalIF":4.7000,"publicationDate":"2025-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Nitrite and halides exacerbate the formation of nitrated byproducts during UV/H2O2 oxidation\",\"authors\":\"Hailing Chu , Teng Zhang , Peizeng Yang , Yuefei Ji , Jing Chen , Deyang Kong , Junhe Lu\",\"doi\":\"10.1016/j.jphotochem.2025.116797\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>The UV activated hydrogen peroxide (UV/H<sub>2</sub>O<sub>2</sub>) oxidation process has been recognized as an effective and environmentally friendly approach for wastewater treatment. However, this study reveals that the existence of nitrite (NO<sub>2</sub><sup>−</sup>) can result in the generation of harmful nitrated byproducts in the UV/H<sub>2</sub>O<sub>2</sub> system. The presence of halides, such as bromide (Br<sup>−</sup>), further enhances their formation. Br<sup>−</sup> can interact with •OH to produce bromine radicals and free bromine. Instead of being reduced back by H<sub>2</sub>O<sub>2</sub>, these reactive bromine species can rapidly combine with NO<sub>2</sub><sup>−</sup>, yielding nitryl bromide (BrNO<sub>2</sub>). Subsequently, natural organic matter (NOM) can be attacked by BrNO<sub>2</sub>, yielding nitrated byproducts. The yield of nitrated byproducts reached 0.902 μM in 4 h when Br<sup>−</sup> and NO<sub>2</sub><sup>−</sup> (both at 200 μM) coexisted in the UV/H<sub>2</sub>O<sub>2</sub> system containing 5 mg<sub>C</sub>/L NOM. Compared to Br<sup>−</sup>, even higher nitrated byproducts formation was observed in the presence of iodide (I<sup>−</sup>), whereas the influence of chloride (Cl<sup>−</sup>) was less significant. This can be attributed to the redox potential of free halogen species (HOX), which positively correlates to their likelihood of being reduced by H<sub>2</sub>O<sub>2</sub>. These findings enhance the understanding of the interplay between halides and NO<sub>2</sub><sup>−</sup> in the UV/H<sub>2</sub>O<sub>2</sub> oxidation process, highlighting potential risks of nitrated products associated with the application of this technology to water containing halides and NO<sub>2</sub><sup>−</sup></div></div>\",\"PeriodicalId\":16782,\"journal\":{\"name\":\"Journal of Photochemistry and Photobiology A-chemistry\",\"volume\":\"472 \",\"pages\":\"Article 116797\"},\"PeriodicalIF\":4.7000,\"publicationDate\":\"2025-09-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Photochemistry and Photobiology A-chemistry\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1010603025005374\",\"RegionNum\":3,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Photochemistry and Photobiology A-chemistry","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1010603025005374","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
Nitrite and halides exacerbate the formation of nitrated byproducts during UV/H2O2 oxidation
The UV activated hydrogen peroxide (UV/H2O2) oxidation process has been recognized as an effective and environmentally friendly approach for wastewater treatment. However, this study reveals that the existence of nitrite (NO2−) can result in the generation of harmful nitrated byproducts in the UV/H2O2 system. The presence of halides, such as bromide (Br−), further enhances their formation. Br− can interact with •OH to produce bromine radicals and free bromine. Instead of being reduced back by H2O2, these reactive bromine species can rapidly combine with NO2−, yielding nitryl bromide (BrNO2). Subsequently, natural organic matter (NOM) can be attacked by BrNO2, yielding nitrated byproducts. The yield of nitrated byproducts reached 0.902 μM in 4 h when Br− and NO2− (both at 200 μM) coexisted in the UV/H2O2 system containing 5 mgC/L NOM. Compared to Br−, even higher nitrated byproducts formation was observed in the presence of iodide (I−), whereas the influence of chloride (Cl−) was less significant. This can be attributed to the redox potential of free halogen species (HOX), which positively correlates to their likelihood of being reduced by H2O2. These findings enhance the understanding of the interplay between halides and NO2− in the UV/H2O2 oxidation process, highlighting potential risks of nitrated products associated with the application of this technology to water containing halides and NO2−
期刊介绍:
JPPA publishes the results of fundamental studies on all aspects of chemical phenomena induced by interactions between light and molecules/matter of all kinds.
All systems capable of being described at the molecular or integrated multimolecular level are appropriate for the journal. This includes all molecular chemical species as well as biomolecular, supramolecular, polymer and other macromolecular systems, as well as solid state photochemistry. In addition, the journal publishes studies of semiconductor and other photoactive organic and inorganic materials, photocatalysis (organic, inorganic, supramolecular and superconductor).
The scope includes condensed and gas phase photochemistry, as well as synchrotron radiation chemistry. A broad range of processes and techniques in photochemistry are covered such as light induced energy, electron and proton transfer; nonlinear photochemical behavior; mechanistic investigation of photochemical reactions and identification of the products of photochemical reactions; quantum yield determinations and measurements of rate constants for primary and secondary photochemical processes; steady-state and time-resolved emission, ultrafast spectroscopic methods, single molecule spectroscopy, time resolved X-ray diffraction, luminescence microscopy, and scattering spectroscopy applied to photochemistry. Papers in emerging and applied areas such as luminescent sensors, electroluminescence, solar energy conversion, atmospheric photochemistry, environmental remediation, and related photocatalytic chemistry are also welcome.