{"title":"钯电沉积在氧化铟锡（ITO）衬底上的动力学和形态学研究","authors":"Luis Humberto Mendoza-Huizar","doi":"10.1007/s10008-025-06291-4","DOIUrl":null,"url":null,"abstract":"<div><p>In this study, a kinetic and morphological study about the palladium (Pd) electrodeposition onto an Indium Tin Oxide (ITO) glass electrode was investigated. The electrodeposition was carried out in a plating bath containing 0.01 M PdCl₂ and 1 M KCl at pH 6. The predominance diagrams showed that the dominant chemical species was PdCl₄<sup>2</sup>⁻. Chronoamperometry was employed to analyze the kinetics of Pd electrodeposits within the potential range of -0.300 to -0.650 V, revealing a progressive nucleation process with high nucleation rate values. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques were employed to characterize Pd electrodeposits on the ITO substrate. At a potential of -0.350 V, dispersed Pd particles were observed, whereas at -0.450 V, the particle density increased. At -0.550 V, a homogeneous deposit was formed, resulting from the overlapping of Pd nuclei.</p></div>","PeriodicalId":665,"journal":{"name":"Journal of Solid State Electrochemistry","volume":"29 9","pages":"3977 - 3987"},"PeriodicalIF":2.6000,"publicationDate":"2025-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Kinetic and morphological study of palladium electrodeposits onto indium tin oxide (ITO) substrates\",\"authors\":\"Luis Humberto Mendoza-Huizar\",\"doi\":\"10.1007/s10008-025-06291-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>In this study, a kinetic and morphological study about the palladium (Pd) electrodeposition onto an Indium Tin Oxide (ITO) glass electrode was investigated. The electrodeposition was carried out in a plating bath containing 0.01 M PdCl₂ and 1 M KCl at pH 6. The predominance diagrams showed that the dominant chemical species was PdCl₄<sup>2</sup>⁻. Chronoamperometry was employed to analyze the kinetics of Pd electrodeposits within the potential range of -0.300 to -0.650 V, revealing a progressive nucleation process with high nucleation rate values. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques were employed to characterize Pd electrodeposits on the ITO substrate. At a potential of -0.350 V, dispersed Pd particles were observed, whereas at -0.450 V, the particle density increased. At -0.550 V, a homogeneous deposit was formed, resulting from the overlapping of Pd nuclei.</p></div>\",\"PeriodicalId\":665,\"journal\":{\"name\":\"Journal of Solid State Electrochemistry\",\"volume\":\"29 9\",\"pages\":\"3977 - 3987\"},\"PeriodicalIF\":2.6000,\"publicationDate\":\"2025-03-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Solid State Electrochemistry\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10008-025-06291-4\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Solid State Electrochemistry","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10008-025-06291-4","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 0
摘要
本文研究了钯（Pd）电沉积在氧化铟锡（ITO）玻璃电极上的动力学和形态学研究。电沉积在含有0.01 M PdCl₂和1 M KCl的镀液中，pH为6。优势图谱显示，主要化学物质为PdCl₄2毒血症。在-0.300 ~ -0.650 V电位范围内，采用计时电流法分析了Pd沉积的动力学，揭示了一个具有高成核速率值的渐进成核过程。采用扫描电子显微镜（SEM）和原子力显微镜（AFM）技术对ITO衬底上的Pd沉积进行了表征。在-0.350 V电位下，Pd粒子分散，而在-0.450 V电位下，粒子密度增加。在-0.550 V时，钯核重叠形成均匀沉积。
Kinetic and morphological study of palladium electrodeposits onto indium tin oxide (ITO) substrates
In this study, a kinetic and morphological study about the palladium (Pd) electrodeposition onto an Indium Tin Oxide (ITO) glass electrode was investigated. The electrodeposition was carried out in a plating bath containing 0.01 M PdCl₂ and 1 M KCl at pH 6. The predominance diagrams showed that the dominant chemical species was PdCl₄2⁻. Chronoamperometry was employed to analyze the kinetics of Pd electrodeposits within the potential range of -0.300 to -0.650 V, revealing a progressive nucleation process with high nucleation rate values. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques were employed to characterize Pd electrodeposits on the ITO substrate. At a potential of -0.350 V, dispersed Pd particles were observed, whereas at -0.450 V, the particle density increased. At -0.550 V, a homogeneous deposit was formed, resulting from the overlapping of Pd nuclei.
期刊介绍：
The Journal of Solid State Electrochemistry is devoted to all aspects of solid-state chemistry and solid-state physics in electrochemistry.
The Journal of Solid State Electrochemistry publishes papers on all aspects of electrochemistry of solid compounds, including experimental and theoretical, basic and applied work. It equally publishes papers on the thermodynamics and kinetics of electrochemical reactions if at least one actively participating phase is solid. Also of interest are articles on the transport of ions and electrons in solids whenever these processes are relevant to electrochemical reactions and on the use of solid-state electrochemical reactions in the analysis of solids and their surfaces.
The journal covers solid-state electrochemistry and focusses on the following fields: mechanisms of solid-state electrochemical reactions, semiconductor electrochemistry, electrochemical batteries, accumulators and fuel cells, electrochemical mineral leaching, galvanic metal plating, electrochemical potential memory devices, solid-state electrochemical sensors, ion and electron transport in solid materials and polymers, electrocatalysis, photoelectrochemistry, corrosion of solid materials, solid-state electroanalysis, electrochemical machining of materials, electrochromism and electrochromic devices, new electrochemical solid-state synthesis.
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