{"title":"超薄芯片级封装用贴装薄膜粘弹性行为的时间-温度叠加表征","authors":"Yi He","doi":"10.1007/s10973-025-14205-9","DOIUrl":null,"url":null,"abstract":"<div><p>Ultra-thin stacked chip scale packaging (UT-SCSP) technology has been widely used to package many non-CPU products, such as wireless and communication devices. In this package, multiple thin silicon dice are stacked on top of each other, and a thin layer of die-attach adhesive is applied between two adjacent Si dice. Consequently, the thermal expansion and viscoelastic properties of the die-attach material have an important effect on package thermal stress and warpage development. In this study, the thermal expansion behavior of a thin film die-attach material used for UT-SCSP applications was determined by thermomechanical analyzer (TMA), whereas the viscoelastic behavior was characterized by conducting time–temperature superposition (TTS) experiments using dynamic mechanical analyzer (DMA). From the TTS results, master curves were constructed for both the storage (<span>\\(E^{\\prime \\prime}\\)</span>), the loss moduli (<span>\\(E^{\\prime \\prime}\\)</span>), and the loss factor (<span>\\(\\text{tan}\\delta )\\)</span> as a function of frequency at a preselected reference temperature. Shift factors were obtained by fitting the experimental data to the Williams–Landel–Ferry (WLF) equation. Knowing the shift factors and the frequency and temperature dependences of <span>\\(E^{\\prime } \\left( {\\omega ,T} \\right)\\)</span> and <span>\\(E^{\\prime \\prime } \\left( {\\omega ,T} \\right)\\)</span>, one can obtain the time dependence of the relaxation modulus <i>E</i>(<i>T</i>, <i>t</i>) for various temperatures. The obtained master curves were analyzed using the Havriliak–Negami relaxation model, from which the four temperature-independent relaxation parameters (<span>\\(\\alpha\\)</span>, <span>\\(\\beta\\)</span>, <span>\\({E}_{0}\\)</span>, and <span>\\({E}_{\\infty }\\)</span>) and one temperature-dependent average relaxation time <span>\\(\\tau (T)\\)</span> can be extracted. These results characterized the relaxation behavior of the die-attach material and provided key material properties for modeling package stress development.</p></div>","PeriodicalId":678,"journal":{"name":"Journal of Thermal Analysis and Calorimetry","volume":"150 10","pages":"7411 - 7423"},"PeriodicalIF":3.1000,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Time–temperature superposition characterization of viscoelastic behavior of a die-attach thin film for ultra-thin stacked chip scale packages\",\"authors\":\"Yi He\",\"doi\":\"10.1007/s10973-025-14205-9\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Ultra-thin stacked chip scale packaging (UT-SCSP) technology has been widely used to package many non-CPU products, such as wireless and communication devices. In this package, multiple thin silicon dice are stacked on top of each other, and a thin layer of die-attach adhesive is applied between two adjacent Si dice. Consequently, the thermal expansion and viscoelastic properties of the die-attach material have an important effect on package thermal stress and warpage development. In this study, the thermal expansion behavior of a thin film die-attach material used for UT-SCSP applications was determined by thermomechanical analyzer (TMA), whereas the viscoelastic behavior was characterized by conducting time–temperature superposition (TTS) experiments using dynamic mechanical analyzer (DMA). From the TTS results, master curves were constructed for both the storage (<span>\\\\(E^{\\\\prime \\\\prime}\\\\)</span>), the loss moduli (<span>\\\\(E^{\\\\prime \\\\prime}\\\\)</span>), and the loss factor (<span>\\\\(\\\\text{tan}\\\\delta )\\\\)</span> as a function of frequency at a preselected reference temperature. Shift factors were obtained by fitting the experimental data to the Williams–Landel–Ferry (WLF) equation. Knowing the shift factors and the frequency and temperature dependences of <span>\\\\(E^{\\\\prime } \\\\left( {\\\\omega ,T} \\\\right)\\\\)</span> and <span>\\\\(E^{\\\\prime \\\\prime } \\\\left( {\\\\omega ,T} \\\\right)\\\\)</span>, one can obtain the time dependence of the relaxation modulus <i>E</i>(<i>T</i>, <i>t</i>) for various temperatures. The obtained master curves were analyzed using the Havriliak–Negami relaxation model, from which the four temperature-independent relaxation parameters (<span>\\\\(\\\\alpha\\\\)</span>, <span>\\\\(\\\\beta\\\\)</span>, <span>\\\\({E}_{0}\\\\)</span>, and <span>\\\\({E}_{\\\\infty }\\\\)</span>) and one temperature-dependent average relaxation time <span>\\\\(\\\\tau (T)\\\\)</span> can be extracted. These results characterized the relaxation behavior of the die-attach material and provided key material properties for modeling package stress development.</p></div>\",\"PeriodicalId\":678,\"journal\":{\"name\":\"Journal of Thermal Analysis and Calorimetry\",\"volume\":\"150 10\",\"pages\":\"7411 - 7423\"},\"PeriodicalIF\":3.1000,\"publicationDate\":\"2025-04-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Thermal Analysis and Calorimetry\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10973-025-14205-9\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, ANALYTICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Thermal Analysis and Calorimetry","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10973-025-14205-9","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
Time–temperature superposition characterization of viscoelastic behavior of a die-attach thin film for ultra-thin stacked chip scale packages
Ultra-thin stacked chip scale packaging (UT-SCSP) technology has been widely used to package many non-CPU products, such as wireless and communication devices. In this package, multiple thin silicon dice are stacked on top of each other, and a thin layer of die-attach adhesive is applied between two adjacent Si dice. Consequently, the thermal expansion and viscoelastic properties of the die-attach material have an important effect on package thermal stress and warpage development. In this study, the thermal expansion behavior of a thin film die-attach material used for UT-SCSP applications was determined by thermomechanical analyzer (TMA), whereas the viscoelastic behavior was characterized by conducting time–temperature superposition (TTS) experiments using dynamic mechanical analyzer (DMA). From the TTS results, master curves were constructed for both the storage (\(E^{\prime \prime}\)), the loss moduli (\(E^{\prime \prime}\)), and the loss factor (\(\text{tan}\delta )\) as a function of frequency at a preselected reference temperature. Shift factors were obtained by fitting the experimental data to the Williams–Landel–Ferry (WLF) equation. Knowing the shift factors and the frequency and temperature dependences of \(E^{\prime } \left( {\omega ,T} \right)\) and \(E^{\prime \prime } \left( {\omega ,T} \right)\), one can obtain the time dependence of the relaxation modulus E(T, t) for various temperatures. The obtained master curves were analyzed using the Havriliak–Negami relaxation model, from which the four temperature-independent relaxation parameters (\(\alpha\), \(\beta\), \({E}_{0}\), and \({E}_{\infty }\)) and one temperature-dependent average relaxation time \(\tau (T)\) can be extracted. These results characterized the relaxation behavior of the die-attach material and provided key material properties for modeling package stress development.
期刊介绍:
Journal of Thermal Analysis and Calorimetry is a fully peer reviewed journal publishing high quality papers covering all aspects of thermal analysis, calorimetry, and experimental thermodynamics. The journal publishes regular and special issues in twelve issues every year. The following types of papers are published: Original Research Papers, Short Communications, Reviews, Modern Instruments, Events and Book reviews.
The subjects covered are: thermogravimetry, derivative thermogravimetry, differential thermal analysis, thermodilatometry, differential scanning calorimetry of all types, non-scanning calorimetry of all types, thermometry, evolved gas analysis, thermomechanical analysis, emanation thermal analysis, thermal conductivity, multiple techniques, and miscellaneous thermal methods (including the combination of the thermal method with various instrumental techniques), theory and instrumentation for thermal analysis and calorimetry.