重离子对硅纳米管隧道场效应管SRAM的影响研究

IF 3.3 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-07-26 DOI:10.1007/s12633-025-03389-2
A. Nisha Justeena, P. Rajendiran, Jihene Mrabet, Swaroop Ramasamy, D. Nirmal
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引用次数: 0

摘要

本文研究了采用硅纳米管隧道场效应晶体管(SiNT-TFET)的六晶体管静态随机存取存储器(6t -SRAM)的工作功能,并分析了SRAM的静态噪声裕度。SiNT-TFET SRAM的HOLD、READ和WRITE SNM静态噪声裕度指标提取值分别为300 mV、200 mV和400 mV。除上述分析外,本文还对SiNT-TFET器件上的单事件瞬态(SET)进行了正入射的研究。此外,还分析了SRAM在重离子辐照下的单事件扰动(SEU)。SET研究表明,在正常入射情况下,渠漏交界处是对辐射打击最敏感的区域。SiNT-TFET SRAM翻转内容物的最小线性能量阈值(leth)为50 MeV/mg/cm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of Heavy-ion impact on Silicon Nanotube Tunnel FET SRAM

This paper investigates the working functionality of six-transistor static random-access memory (6 T-SRAM) using silicon nanotube-tunnel field-effect transistors (SiNT-TFETs) and also analyses the static noise margin of the SiNT-TFET SRAM. The extracted values of static noise margin metrics of SiNT-TFET SRAM, such as HOLD, READ, and WRITE SNM are 300 mV, 200 mV and 400 mV respectively. Apart from the above analysis, the single-event transient (SET) on the SiNT-TFET device is studied for normal incidence. Furthermore, the single-event upset (SEU) is analysed on the SiNT-TFET SRAM during heavy ion irradiation. The SET study shows that the channel-drain junction is the most sensitive region to radiation strikes for normal incidence. The SiNT-TFET SRAM flipped the content for a minimum linear energy threshold (LETTH) value of 50 MeV/mg/cm2.

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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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