用于高透过率线性可变滤光片的SiO2薄膜的室温反应溅射。

IF 3.3 2区 物理与天体物理 Q2 OPTICS
Optics express Pub Date : 2025-09-08 DOI:10.1364/OE.569379
Er-Tao Hu, Feng Yu, Jiawei Liu, Yongpeng Li, Peicheng Lin, Qi Zhang, Kehan Yu, Qing-Yuan Cai, Wei Wei
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引用次数: 0

摘要

为了解决传统射频磁控溅射SiO2靶材的局限性,特别是沉积速率低和明显的光吸收,我们采用纯硅靶材进行射频磁控溅射制备了高质量的SiO2薄膜。室温(RT)沉积工艺消除了对衬底加热的需要,从而提高了性能,包括消除光学吸收和沉积速率增加两倍(从1.15 nm/min到2.85 nm/min),正如光谱椭偏振和x射线光电子能谱(XPS)表征所证实的那样。在此基础上,我们设计了线性可变滤光片(LVOFs),用于500-700 nm范围内的光谱工作,结合了反应溅射SiO2和RF溅射TiO2。lvof的平均透过率从67.7%提高到93.6%。与温度相关的光谱分析显示,在110°C时,相对于RT测量值,热诱导蓝移为3.0 nm。这项工作建立了RT反应磁控溅射作为高性能滤光片的有效制造策略,在需要精确的光谱控制和环境温度沉积过程中的热稳定性的应用中显示出特别的希望。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Room-temperature reactive sputtering of SiO2 films for high-transmittance linear variable optical filters.

To address the limitations of conventional radio frequency (RF) magnetron sputtering using SiO2 target - particularly low deposition rates and pronounced optical absorption, we developed high-quality SiO2 thin films via RF reactive magnetron sputtering with a pure silicon target. The room-temperature (RT) deposition process eliminates the need for substrate heating, resulting in enhanced performance, including the removal of optical absorption and a twofold increase in deposition rate (from 1.15 to 2.85 nm/min), as verified by spectroscopic ellipsometry and X-ray photoelectron spectroscopy (XPS) characterization. Building on this advancement, we engineered linear variable optical filters (LVOFs) for spectral operation in the 500-700 nm range by combining the reactive-sputtered SiO2 and RF sputtered TiO2. The LVOFs demonstrated remarkable improvement of average transmittance from 67.7% to 93.6%. Temperature-dependent spectral analysis revealed a thermally-induced blue shift of 3.0 nm at 110 °C relative to RT measurements. This work establishes RT reactive magnetron sputtering as an effective fabrication strategy for high-performance optical filters, showing particular promise for applications requiring precise spectral control and thermal stability in ambient temperature deposition processes.

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来源期刊
Optics express
Optics express 物理-光学
CiteScore
6.60
自引率
15.80%
发文量
5182
审稿时长
2.1 months
期刊介绍: Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.
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