{"title":"用于高透过率线性可变滤光片的SiO2薄膜的室温反应溅射。","authors":"Er-Tao Hu, Feng Yu, Jiawei Liu, Yongpeng Li, Peicheng Lin, Qi Zhang, Kehan Yu, Qing-Yuan Cai, Wei Wei","doi":"10.1364/OE.569379","DOIUrl":null,"url":null,"abstract":"<p><p>To address the limitations of conventional radio frequency (RF) magnetron sputtering using SiO<sub>2</sub> target - particularly low deposition rates and pronounced optical absorption, we developed high-quality SiO<sub>2</sub> thin films via RF reactive magnetron sputtering with a pure silicon target. The room-temperature (RT) deposition process eliminates the need for substrate heating, resulting in enhanced performance, including the removal of optical absorption and a twofold increase in deposition rate (from 1.15 to 2.85 nm/min), as verified by spectroscopic ellipsometry and X-ray photoelectron spectroscopy (XPS) characterization. Building on this advancement, we engineered linear variable optical filters (LVOFs) for spectral operation in the 500-700 nm range by combining the reactive-sputtered SiO<sub>2</sub> and RF sputtered TiO<sub>2</sub>. The LVOFs demonstrated remarkable improvement of average transmittance from 67.7% to 93.6%. Temperature-dependent spectral analysis revealed a thermally-induced blue shift of 3.0 nm at 110 °C relative to RT measurements. This work establishes RT reactive magnetron sputtering as an effective fabrication strategy for high-performance optical filters, showing particular promise for applications requiring precise spectral control and thermal stability in ambient temperature deposition processes.</p>","PeriodicalId":19691,"journal":{"name":"Optics express","volume":"33 18","pages":"38515-38523"},"PeriodicalIF":3.3000,"publicationDate":"2025-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Room-temperature reactive sputtering of SiO<sub>2</sub> films for high-transmittance linear variable optical filters.\",\"authors\":\"Er-Tao Hu, Feng Yu, Jiawei Liu, Yongpeng Li, Peicheng Lin, Qi Zhang, Kehan Yu, Qing-Yuan Cai, Wei Wei\",\"doi\":\"10.1364/OE.569379\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><p>To address the limitations of conventional radio frequency (RF) magnetron sputtering using SiO<sub>2</sub> target - particularly low deposition rates and pronounced optical absorption, we developed high-quality SiO<sub>2</sub> thin films via RF reactive magnetron sputtering with a pure silicon target. The room-temperature (RT) deposition process eliminates the need for substrate heating, resulting in enhanced performance, including the removal of optical absorption and a twofold increase in deposition rate (from 1.15 to 2.85 nm/min), as verified by spectroscopic ellipsometry and X-ray photoelectron spectroscopy (XPS) characterization. Building on this advancement, we engineered linear variable optical filters (LVOFs) for spectral operation in the 500-700 nm range by combining the reactive-sputtered SiO<sub>2</sub> and RF sputtered TiO<sub>2</sub>. The LVOFs demonstrated remarkable improvement of average transmittance from 67.7% to 93.6%. Temperature-dependent spectral analysis revealed a thermally-induced blue shift of 3.0 nm at 110 °C relative to RT measurements. This work establishes RT reactive magnetron sputtering as an effective fabrication strategy for high-performance optical filters, showing particular promise for applications requiring precise spectral control and thermal stability in ambient temperature deposition processes.</p>\",\"PeriodicalId\":19691,\"journal\":{\"name\":\"Optics express\",\"volume\":\"33 18\",\"pages\":\"38515-38523\"},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2025-09-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics express\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1364/OE.569379\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics express","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1364/OE.569379","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"OPTICS","Score":null,"Total":0}
Room-temperature reactive sputtering of SiO2 films for high-transmittance linear variable optical filters.
To address the limitations of conventional radio frequency (RF) magnetron sputtering using SiO2 target - particularly low deposition rates and pronounced optical absorption, we developed high-quality SiO2 thin films via RF reactive magnetron sputtering with a pure silicon target. The room-temperature (RT) deposition process eliminates the need for substrate heating, resulting in enhanced performance, including the removal of optical absorption and a twofold increase in deposition rate (from 1.15 to 2.85 nm/min), as verified by spectroscopic ellipsometry and X-ray photoelectron spectroscopy (XPS) characterization. Building on this advancement, we engineered linear variable optical filters (LVOFs) for spectral operation in the 500-700 nm range by combining the reactive-sputtered SiO2 and RF sputtered TiO2. The LVOFs demonstrated remarkable improvement of average transmittance from 67.7% to 93.6%. Temperature-dependent spectral analysis revealed a thermally-induced blue shift of 3.0 nm at 110 °C relative to RT measurements. This work establishes RT reactive magnetron sputtering as an effective fabrication strategy for high-performance optical filters, showing particular promise for applications requiring precise spectral control and thermal stability in ambient temperature deposition processes.
期刊介绍:
Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.