{"title":"航空航天红外伪装用Ag+ TiN-TiN-Al2O3多层涂层的热光学性能","authors":"Rohit Bharti , Mohammad Mursaleen , Abhijit Dey","doi":"10.1016/j.micrna.2025.208359","DOIUrl":null,"url":null,"abstract":"<div><div>Ag+TiN–TiN–Al<sub>2</sub>O<sub>3</sub> multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.</div></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"208 ","pages":"Article 208359"},"PeriodicalIF":3.0000,"publicationDate":"2025-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thermal and optical performance of Ag+TiN–TiN–Al2O3 multilayer coatings for infrared camouflage in aerospace applications\",\"authors\":\"Rohit Bharti , Mohammad Mursaleen , Abhijit Dey\",\"doi\":\"10.1016/j.micrna.2025.208359\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Ag+TiN–TiN–Al<sub>2</sub>O<sub>3</sub> multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.</div></div>\",\"PeriodicalId\":100923,\"journal\":{\"name\":\"Micro and Nanostructures\",\"volume\":\"208 \",\"pages\":\"Article 208359\"},\"PeriodicalIF\":3.0000,\"publicationDate\":\"2025-09-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Micro and Nanostructures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2773012325002882\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micro and Nanostructures","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2773012325002882","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Thermal and optical performance of Ag+TiN–TiN–Al2O3 multilayer coatings for infrared camouflage in aerospace applications
Ag+TiN–TiN–Al2O3 multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.