航空航天红外伪装用Ag+ TiN-TiN-Al2O3多层涂层的热光学性能

IF 3 Q2 PHYSICS, CONDENSED MATTER
Rohit Bharti , Mohammad Mursaleen , Abhijit Dey
{"title":"航空航天红外伪装用Ag+ TiN-TiN-Al2O3多层涂层的热光学性能","authors":"Rohit Bharti ,&nbsp;Mohammad Mursaleen ,&nbsp;Abhijit Dey","doi":"10.1016/j.micrna.2025.208359","DOIUrl":null,"url":null,"abstract":"<div><div>Ag+TiN–TiN–Al<sub>2</sub>O<sub>3</sub> multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.</div></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"208 ","pages":"Article 208359"},"PeriodicalIF":3.0000,"publicationDate":"2025-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thermal and optical performance of Ag+TiN–TiN–Al2O3 multilayer coatings for infrared camouflage in aerospace applications\",\"authors\":\"Rohit Bharti ,&nbsp;Mohammad Mursaleen ,&nbsp;Abhijit Dey\",\"doi\":\"10.1016/j.micrna.2025.208359\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Ag+TiN–TiN–Al<sub>2</sub>O<sub>3</sub> multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.</div></div>\",\"PeriodicalId\":100923,\"journal\":{\"name\":\"Micro and Nanostructures\",\"volume\":\"208 \",\"pages\":\"Article 208359\"},\"PeriodicalIF\":3.0000,\"publicationDate\":\"2025-09-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Micro and Nanostructures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2773012325002882\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micro and Nanostructures","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2773012325002882","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0

摘要

采用多靶磁控溅射技术在Si(100)衬底上沉积了Ag+ TiN-TiN-Al2O3多层涂层。研究了300℃、400℃和500℃真空退火对材料结构、形貌和光学性能(包括红外发射率)的影响。XRD分析表明,在400°C时结晶度得到改善,而在500°C时发生部分降解。FESEM显示,随着温度的升高,晶粒粗化,表面致密化。退火后,光反射率增加,禁带宽度在400℃时达到最大值2.30 eV, 500℃时由于缺陷的形成,禁带宽度逐渐收窄。基于ftir的分析表明,在400°C时,在3-5 μm范围内的最小发射率为0.102。结果表明,400°C是实现低发射率、高结构有序和稳定光学性能的最佳退火温度,使涂层适用于航空航天应用中的红外隐身和热管理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal and optical performance of Ag+TiN–TiN–Al2O3 multilayer coatings for infrared camouflage in aerospace applications
Ag+TiN–TiN–Al2O3 multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
6.50
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信