Fei Sun , Junyan Wang , Cheng Hou , Zirui Cui , Xinchang Li , Zeng Lin
{"title":"不同氮氢比下电弧等离子体渗氮处理Ti6Al4V合金的表面特性","authors":"Fei Sun , Junyan Wang , Cheng Hou , Zirui Cui , Xinchang Li , Zeng Lin","doi":"10.1016/j.surfcoat.2025.132696","DOIUrl":null,"url":null,"abstract":"<div><div>The arc plasma nitriding technology has been widely applied in the field of surface engineering due to its advantages such as high production efficiency, process flexibility, and environmental friendliness. To address the issues of insufficient wear resistance and corrosion resistance of Ti6Al4V (TC4) alloy surfaces, this study employs an arc discharge-assisted ion etching (IET) device for the plasma nitriding treatment of TC4 alloy, aiming to enhance its performance. The processing conditions were set at a temperature of 500 °C, a bias voltage of 400 V, and a pressure of 1.5 Pa. Four different gas mixtures were introduced: pure nitrogen, a nitrogen‑hydrogen ratio of 2:1, a nitrogen‑hydrogen ratio of 1:1, and a nitrogen‑hydrogen ratio of 1:2. The duration of the process was maintained for 2 h. Test results indicate that the introduction of hydrogen can enhance the diffusion capability of nitrogen elements in the TC4 alloy matrix, thereby improving the nitriding effect and forming dense layers of TiN and Ti<sub>2</sub>N. Nitriding significantly enhances the microhardness, wear resistance, and corrosion resistance of TC4 alloys. Moreover, the optimal performance is achieved when the ratio of nitrogen to hydrogen is 2:1. Therefore, the ratio of nitrogen to hydrogen in the arc plasma nitriding process significantly affects the surface properties of titanium alloys, which may contribute to enhancing the long-term service performance of TC4 alloys in the field of biomedical implants.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"516 ","pages":"Article 132696"},"PeriodicalIF":6.1000,"publicationDate":"2025-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Surface characteristics of Ti6Al4V alloy treated by arc plasma nitriding under different nitrogen‑hydrogen ratios\",\"authors\":\"Fei Sun , Junyan Wang , Cheng Hou , Zirui Cui , Xinchang Li , Zeng Lin\",\"doi\":\"10.1016/j.surfcoat.2025.132696\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>The arc plasma nitriding technology has been widely applied in the field of surface engineering due to its advantages such as high production efficiency, process flexibility, and environmental friendliness. To address the issues of insufficient wear resistance and corrosion resistance of Ti6Al4V (TC4) alloy surfaces, this study employs an arc discharge-assisted ion etching (IET) device for the plasma nitriding treatment of TC4 alloy, aiming to enhance its performance. The processing conditions were set at a temperature of 500 °C, a bias voltage of 400 V, and a pressure of 1.5 Pa. Four different gas mixtures were introduced: pure nitrogen, a nitrogen‑hydrogen ratio of 2:1, a nitrogen‑hydrogen ratio of 1:1, and a nitrogen‑hydrogen ratio of 1:2. The duration of the process was maintained for 2 h. Test results indicate that the introduction of hydrogen can enhance the diffusion capability of nitrogen elements in the TC4 alloy matrix, thereby improving the nitriding effect and forming dense layers of TiN and Ti<sub>2</sub>N. Nitriding significantly enhances the microhardness, wear resistance, and corrosion resistance of TC4 alloys. Moreover, the optimal performance is achieved when the ratio of nitrogen to hydrogen is 2:1. Therefore, the ratio of nitrogen to hydrogen in the arc plasma nitriding process significantly affects the surface properties of titanium alloys, which may contribute to enhancing the long-term service performance of TC4 alloys in the field of biomedical implants.</div></div>\",\"PeriodicalId\":22009,\"journal\":{\"name\":\"Surface & Coatings Technology\",\"volume\":\"516 \",\"pages\":\"Article 132696\"},\"PeriodicalIF\":6.1000,\"publicationDate\":\"2025-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface & Coatings Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0257897225009703\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface & Coatings Technology","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0257897225009703","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
Surface characteristics of Ti6Al4V alloy treated by arc plasma nitriding under different nitrogen‑hydrogen ratios
The arc plasma nitriding technology has been widely applied in the field of surface engineering due to its advantages such as high production efficiency, process flexibility, and environmental friendliness. To address the issues of insufficient wear resistance and corrosion resistance of Ti6Al4V (TC4) alloy surfaces, this study employs an arc discharge-assisted ion etching (IET) device for the plasma nitriding treatment of TC4 alloy, aiming to enhance its performance. The processing conditions were set at a temperature of 500 °C, a bias voltage of 400 V, and a pressure of 1.5 Pa. Four different gas mixtures were introduced: pure nitrogen, a nitrogen‑hydrogen ratio of 2:1, a nitrogen‑hydrogen ratio of 1:1, and a nitrogen‑hydrogen ratio of 1:2. The duration of the process was maintained for 2 h. Test results indicate that the introduction of hydrogen can enhance the diffusion capability of nitrogen elements in the TC4 alloy matrix, thereby improving the nitriding effect and forming dense layers of TiN and Ti2N. Nitriding significantly enhances the microhardness, wear resistance, and corrosion resistance of TC4 alloys. Moreover, the optimal performance is achieved when the ratio of nitrogen to hydrogen is 2:1. Therefore, the ratio of nitrogen to hydrogen in the arc plasma nitriding process significantly affects the surface properties of titanium alloys, which may contribute to enhancing the long-term service performance of TC4 alloys in the field of biomedical implants.
期刊介绍:
Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance:
A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting.
B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.