{"title":"大规模生产适用于快速封闭空间蒸发的高效Cs3Cu2I5 x射线闪烁体","authors":"Hao-Cheng Lin, , , Yung-Tang Chuang, , , Pei-En Jan, , , Hung-Ming Chen, , , Po-Yu Chen, , , Kuo-Wei Huang, , , Ming-Tsun Kuo, , , Sinn-Wen Chen, , and , Hao-Wu Lin*, ","doi":"10.1021/acsaelm.5c01257","DOIUrl":null,"url":null,"abstract":"<p >Advancing X-ray imaging systems necessitate scintillators that deliver both high sensitivity and high spatial resolution, a long-standing challenge due to material and fabrication limitations. Low-dimensional metal halides such as Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> are intrinsically promising for this application, yet scalable synthesis of thick, high-quality films remains a significant bottleneck. We introduce a rapid (∼minutes) and highly efficient closed-space evaporation (CSE) method for growing phase-pure Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> films up to and exceeding 100 μm in thickness. These films function as high-performance scintillators, exhibiting a remarkable light yield of 55,000 photons/MeV, enabling X-ray detection at an exceptionally low dose rate of 0.21 nGy<sub>air</sub>/s, and achieving a spatial resolution of up to 23 lp/mm. Furthermore, they demonstrate outstanding radiation hardness, maintaining stable characteristics after an exposure equivalent to more than 3,000 clinical chest image X-ray exposures. This CSE technique represents a transformative approach to fabricating high-quality metal halide scintillators, opening avenues for the development of cost-effective, ultrasensitive, and high-resolution X-ray imaging modalities.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"7 18","pages":"8492–8500"},"PeriodicalIF":4.7000,"publicationDate":"2025-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsaelm.5c01257","citationCount":"0","resultStr":"{\"title\":\"Efficient Cs3Cu2I5 X-ray Scintillators by Mass-Production-Applicable Fast-Closed-Space-Evaporation\",\"authors\":\"Hao-Cheng Lin, , , Yung-Tang Chuang, , , Pei-En Jan, , , Hung-Ming Chen, , , Po-Yu Chen, , , Kuo-Wei Huang, , , Ming-Tsun Kuo, , , Sinn-Wen Chen, , and , Hao-Wu Lin*, \",\"doi\":\"10.1021/acsaelm.5c01257\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >Advancing X-ray imaging systems necessitate scintillators that deliver both high sensitivity and high spatial resolution, a long-standing challenge due to material and fabrication limitations. Low-dimensional metal halides such as Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> are intrinsically promising for this application, yet scalable synthesis of thick, high-quality films remains a significant bottleneck. We introduce a rapid (∼minutes) and highly efficient closed-space evaporation (CSE) method for growing phase-pure Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> films up to and exceeding 100 μm in thickness. These films function as high-performance scintillators, exhibiting a remarkable light yield of 55,000 photons/MeV, enabling X-ray detection at an exceptionally low dose rate of 0.21 nGy<sub>air</sub>/s, and achieving a spatial resolution of up to 23 lp/mm. Furthermore, they demonstrate outstanding radiation hardness, maintaining stable characteristics after an exposure equivalent to more than 3,000 clinical chest image X-ray exposures. This CSE technique represents a transformative approach to fabricating high-quality metal halide scintillators, opening avenues for the development of cost-effective, ultrasensitive, and high-resolution X-ray imaging modalities.</p>\",\"PeriodicalId\":3,\"journal\":{\"name\":\"ACS Applied Electronic Materials\",\"volume\":\"7 18\",\"pages\":\"8492–8500\"},\"PeriodicalIF\":4.7000,\"publicationDate\":\"2025-09-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://pubs.acs.org/doi/pdf/10.1021/acsaelm.5c01257\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Electronic Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.acs.org/doi/10.1021/acsaelm.5c01257\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.5c01257","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Efficient Cs3Cu2I5 X-ray Scintillators by Mass-Production-Applicable Fast-Closed-Space-Evaporation
Advancing X-ray imaging systems necessitate scintillators that deliver both high sensitivity and high spatial resolution, a long-standing challenge due to material and fabrication limitations. Low-dimensional metal halides such as Cs3Cu2I5 are intrinsically promising for this application, yet scalable synthesis of thick, high-quality films remains a significant bottleneck. We introduce a rapid (∼minutes) and highly efficient closed-space evaporation (CSE) method for growing phase-pure Cs3Cu2I5 films up to and exceeding 100 μm in thickness. These films function as high-performance scintillators, exhibiting a remarkable light yield of 55,000 photons/MeV, enabling X-ray detection at an exceptionally low dose rate of 0.21 nGyair/s, and achieving a spatial resolution of up to 23 lp/mm. Furthermore, they demonstrate outstanding radiation hardness, maintaining stable characteristics after an exposure equivalent to more than 3,000 clinical chest image X-ray exposures. This CSE technique represents a transformative approach to fabricating high-quality metal halide scintillators, opening avenues for the development of cost-effective, ultrasensitive, and high-resolution X-ray imaging modalities.
期刊介绍:
ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric.
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