增材制造Ti6Al4V的辐射耐受性：Au2+离子辐照下的抗溶胀与位错介导硬化

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-09-15 DOI:10.1016/j.vacuum.2025.114755

Chuan Lv , Luhang Yan , Ping Xu , Linfeng Ye , An Li , Lvjun Zhou

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引用次数: 0

摘要

增材制造（AM） Ti6Al4V由于其独特的非平衡微观结构，具有马氏体α′和高密度位错，与传统的Ti6Al4V相比，表现出完全不同的辐照响应。本研究采用6mev的Au2+离子辐照模拟中子损伤，系统探讨AM Ti6Al4V的辐照损伤机制。重离子辐照后样品的TEM表征显示辐照影响区延伸至1.11 μm，表面-近端区域含有高密度位错结构。纳米压痕分析表明，固有的高缺陷密度赋予了优异的抗膨胀性，而辐照诱导的位错环却自相矛盾地导致了明显的硬化（硬度：7.38 GPa）。

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Radiation tolerance of additively manufactured Ti6Al4V: Swelling resistance versus dislocation-mediated hardening under Au2+ ion irradiation

Additively manufactured (AM) Ti6Al4V exhibits fundamentally distinct irradiation responses compared to conventional counterparts, attributable to its unique non-equilibrium microstructure featuring martensite α′ and high-density dislocations. This study employs 6 MeV Au²⁺ ion irradiation to simulate neutron damage, systematically investigating irradiation damage mechanisms in AM Ti6Al4V. TEM characterization of heavy-ion irradiated specimens reveals an irradiation-affected zone extending to 1.11 μm, with surface-proximal regions containing high-density dislocation structures. Nanoindentation analysis demonstrates that the inherent high defect density confers exceptional swelling resistance, while irradiation-induced dislocation loops paradoxically cause pronounced hardening (hardness: 7.38 GPa).

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.