聚对苯二甲酸乙二醇酯衬底上化学气相沉积二维单层二硫化钼纳米膜的铂肖特基触点

IF 3 Q2 PHYSICS, CONDENSED MATTER
Peddathimula Puneetha , Siva Pratap Reddy Mallem , Dong Yeon Lee , Jaesool Shim , Sung Jin An
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引用次数: 0

摘要

为了促进下一代纳米级电子学的发展,了解电子特征如何在纳米级器件中发挥作用至关重要,例如基于纳米膜的二维过渡金属二硫化物(2D-TMDC)器件。特别是,基于化学气相沉积(CVD)的单层二硫化钼(MoS2)器件在低开关电压下运行,降低了能耗。在本研究中,我们利用电流-电压(I-V)和电容-电压(C-V)测量研究了转移到聚对苯二甲酸乙二醇酯(PET)衬底上的单层MoS2纳米膜上铂肖特基触点的电特性。纳米膜接触的平均势垒高度(Φb)和平均理想因子(n)分别为0.68 eV和2.28 eV。Φb和串联电阻(RS)的值由张的方法得出,并与Norde的方法进行比较。所得到的数值是一致的。此外,界面态密度分布范围为1.07 × 1013 cm−2eV−1 (0.44 eV)至6.24 × 1012 cm−2eV−1 (0.66 eV)。结果表明,基于mos2的纳米膜肖特基触点可以局部应用于2D-TMDCs电子器件中,这将有助于和指导未来的研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Platinum Schottky contacts on chemical vapor deposited two-dimensional monolayer MoS2 nanofilms transferred on polyethylene terephthalate substrate
To promote the development of next-generation nano-sized electronics, it is essential to comprehend how electron features function in nanoscale devices, such as those based on two-dimensional transition metal dichalcogenide (2D-TMDC) based on nanofilms. Particularly, monolayer molybdenum disulfide (MoS2) devices based on chemical vapor deposited (CVD) were run with low switching voltages and reduced energy consumption. In the present work, we have studied the electrical features of platinum Schottky contacts on monolayer MoS2 nanofilms transferred on polyethylene terephthalate (PET) substrates using current−voltage (I–V) and capacitance−voltage (C–V) measurements. The mean barrier height (Φb) and mean ideality factor (n) of nanofilm contacts are determined to be 0.68 eV and 2.28 respectively. The values of Φb and series resistance (RS) were derived from Cheung's method and are compared with Norde's method. The values obtained are good in accord with one another. Further, the interface state density (NSS) distribution was ranged from 1.07 × 1013 cm−2eV−1 (at 0.44 eV) to 6.24 × 1012 cm−2eV−1 (at 0.66 eV). According to the results, MoS2-based nanofilm Schottky contacts can be applied topically in 2D-TMDCs electronic device applications, which will help and guide future research.
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CiteScore
6.50
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