{"title":"Ag/Al/SiO2/n-Si/Ag异质结构的界面工程和介电可调性:电阻性记忆和高κ电子学的新见解","authors":"A. Ashery","doi":"10.1016/j.physb.2025.417758","DOIUrl":null,"url":null,"abstract":"<div><div>This study presents a comprehensive investigation of the dielectric and electrical properties of Ag/Al/SiO<sub>2</sub>/n-Si/Ag heterostructures using impedance spectroscopy, modulus formalism, and temperature-dependent current-voltage (I-V) analysis. The incorporation of an Al interlayer between Ag and SiO<sub>2</sub> introduces unique interfacial effects, modifying charge transport dynamics, dielectric relaxation, and barrier height distribution. Key findings include: Frequency- and voltage-dependent dielectric relaxation, revealing Maxwell-Wagner polarization and interfacial trap effects, with non-Debye behavior due to distributed relaxation times. Temperature-activated conduction mechanisms, including thermionic emission, hopping transport, and space-charge-limited conduction (SCLC), influenced by SiO<sub>2</sub> thickness and defect states.AC conductivity analysis following Jonscher's power law, with distinct low-frequency (ohmic) and high-frequency (dispersive) regimes. Barrier height inhomogeneity, extracted via modified Richardson plots, showing a Gaussian distribution of Schottky barriers due to interfacial disorder. Novelty: Unlike conventional MOS structures, the dual-metal (Ag/Al) electrode enhances interfacial dipoles and modifies charge injection, while the SiO<sub>2</sub>/n-Si interface governs dielectric losses and capacitive memory effects. This work bridges the gap between organic-inorganic hybrid dielectrics and traditional SiO<sub>2</sub>-based devices, offering insights into defect engineering for tunable dielectric response. Potential Applications.</div><div>Non-volatile resistive memory (RRAM) – Exploiting voltage-dependent dielectric relaxation for low-power neuromorphic computing. High-κ gate dielectrics – Optimizing SiO<sub>2</sub> thickness for reduced leakage currents in MOSFETs. Flexible electronics – Hybridizing with polymer composites (e.g., P3HT:PCBM) for stretchable capacitive sensors. Thermal/voltage sensors – Utilizing tanδ and modulus dispersion for environmental sensing applications.</div></div>","PeriodicalId":20116,"journal":{"name":"Physica B-condensed Matter","volume":"717 ","pages":"Article 417758"},"PeriodicalIF":2.8000,"publicationDate":"2025-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Interfacial engineering and dielectric tunability in Ag/Al/SiO2/n-Si/Ag heterostructures: Novel insights for resistive memory and high-κ electronics\",\"authors\":\"A. Ashery\",\"doi\":\"10.1016/j.physb.2025.417758\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This study presents a comprehensive investigation of the dielectric and electrical properties of Ag/Al/SiO<sub>2</sub>/n-Si/Ag heterostructures using impedance spectroscopy, modulus formalism, and temperature-dependent current-voltage (I-V) analysis. The incorporation of an Al interlayer between Ag and SiO<sub>2</sub> introduces unique interfacial effects, modifying charge transport dynamics, dielectric relaxation, and barrier height distribution. Key findings include: Frequency- and voltage-dependent dielectric relaxation, revealing Maxwell-Wagner polarization and interfacial trap effects, with non-Debye behavior due to distributed relaxation times. Temperature-activated conduction mechanisms, including thermionic emission, hopping transport, and space-charge-limited conduction (SCLC), influenced by SiO<sub>2</sub> thickness and defect states.AC conductivity analysis following Jonscher's power law, with distinct low-frequency (ohmic) and high-frequency (dispersive) regimes. Barrier height inhomogeneity, extracted via modified Richardson plots, showing a Gaussian distribution of Schottky barriers due to interfacial disorder. Novelty: Unlike conventional MOS structures, the dual-metal (Ag/Al) electrode enhances interfacial dipoles and modifies charge injection, while the SiO<sub>2</sub>/n-Si interface governs dielectric losses and capacitive memory effects. This work bridges the gap between organic-inorganic hybrid dielectrics and traditional SiO<sub>2</sub>-based devices, offering insights into defect engineering for tunable dielectric response. Potential Applications.</div><div>Non-volatile resistive memory (RRAM) – Exploiting voltage-dependent dielectric relaxation for low-power neuromorphic computing. High-κ gate dielectrics – Optimizing SiO<sub>2</sub> thickness for reduced leakage currents in MOSFETs. Flexible electronics – Hybridizing with polymer composites (e.g., P3HT:PCBM) for stretchable capacitive sensors. Thermal/voltage sensors – Utilizing tanδ and modulus dispersion for environmental sensing applications.</div></div>\",\"PeriodicalId\":20116,\"journal\":{\"name\":\"Physica B-condensed Matter\",\"volume\":\"717 \",\"pages\":\"Article 417758\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-09-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica B-condensed Matter\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0921452625008750\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica B-condensed Matter","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0921452625008750","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Interfacial engineering and dielectric tunability in Ag/Al/SiO2/n-Si/Ag heterostructures: Novel insights for resistive memory and high-κ electronics
This study presents a comprehensive investigation of the dielectric and electrical properties of Ag/Al/SiO2/n-Si/Ag heterostructures using impedance spectroscopy, modulus formalism, and temperature-dependent current-voltage (I-V) analysis. The incorporation of an Al interlayer between Ag and SiO2 introduces unique interfacial effects, modifying charge transport dynamics, dielectric relaxation, and barrier height distribution. Key findings include: Frequency- and voltage-dependent dielectric relaxation, revealing Maxwell-Wagner polarization and interfacial trap effects, with non-Debye behavior due to distributed relaxation times. Temperature-activated conduction mechanisms, including thermionic emission, hopping transport, and space-charge-limited conduction (SCLC), influenced by SiO2 thickness and defect states.AC conductivity analysis following Jonscher's power law, with distinct low-frequency (ohmic) and high-frequency (dispersive) regimes. Barrier height inhomogeneity, extracted via modified Richardson plots, showing a Gaussian distribution of Schottky barriers due to interfacial disorder. Novelty: Unlike conventional MOS structures, the dual-metal (Ag/Al) electrode enhances interfacial dipoles and modifies charge injection, while the SiO2/n-Si interface governs dielectric losses and capacitive memory effects. This work bridges the gap between organic-inorganic hybrid dielectrics and traditional SiO2-based devices, offering insights into defect engineering for tunable dielectric response. Potential Applications.
Non-volatile resistive memory (RRAM) – Exploiting voltage-dependent dielectric relaxation for low-power neuromorphic computing. High-κ gate dielectrics – Optimizing SiO2 thickness for reduced leakage currents in MOSFETs. Flexible electronics – Hybridizing with polymer composites (e.g., P3HT:PCBM) for stretchable capacitive sensors. Thermal/voltage sensors – Utilizing tanδ and modulus dispersion for environmental sensing applications.
期刊介绍:
Physica B: Condensed Matter comprises all condensed matter and material physics that involve theoretical, computational and experimental work.
Papers should contain further developments and a proper discussion on the physics of experimental or theoretical results in one of the following areas:
-Magnetism
-Materials physics
-Nanostructures and nanomaterials
-Optics and optical materials
-Quantum materials
-Semiconductors
-Strongly correlated systems
-Superconductivity
-Surfaces and interfaces