Madani Labed , Chowdam Venkata Prasad , Ho Jung Jeon , Kyong Jae Kim , Jang Hyeok Park , Stephen Pearton , You Seung Rim
{"title":"克服材料限制的氧化镓在功率器件中的应用进展","authors":"Madani Labed , Chowdam Venkata Prasad , Ho Jung Jeon , Kyong Jae Kim , Jang Hyeok Park , Stephen Pearton , You Seung Rim","doi":"10.1016/j.mattod.2025.08.007","DOIUrl":null,"url":null,"abstract":"<div><div>In recent years, gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) has garnered growing attention as a next-generation ultrawide bandgap (UWBG) semiconductor, owing to its exceptional material properties namely, its wide bandgap (∼4.8 eV), high breakdown electric field, and suitability for high-efficiency and high-voltage power electronic applications. This rising interest is reflected in the increasing volume of published research and the organization of dedicated international conferences. This comprehensive review provides an in-depth overview of the intrinsic properties of Ga<sub>2</sub>O<sub>3</sub> and highlights recent progress in material growth, device fabrication, and performance enhancement. Emphasis is placed on the critical challenges that currently impede the large-scale commercialization of Ga<sub>2</sub>O<sub>3</sub>-based devices. These include the longstanding difficulty in achieving stable p-type conductivity, the inherently low thermal conductivity, the presence of crystallographic defects such as nano- and micro-voids, the limitations of wet etching processes, and the high fabrication cost all of which collectively hinder device reliability and scalability. We also explore the latest strategies developed to address these challenges, including novel doping techniques to realize p-type behavior, thermal management solutions, defect passivation approaches, and innovations in selective etching and surface treatment. In addition, alloying strategies involving elements such as aluminum (Al) and iridium (Ir) are discussed for their potential to tune material properties, mitigate limitations, and enhance overall device performance. By consolidating recent advancements and addressing the remaining bottlenecks, this review aims to provide a comprehensive perspective on the state-of-the-art in Ga<sub>2</sub>O<sub>3</sub> research. It offers valuable insights for both academic researchers and industry professionals working toward the realization of commercially viable Ga<sub>2</sub>O<sub>3</sub>-based power electronic devices.</div></div>","PeriodicalId":387,"journal":{"name":"Materials Today","volume":"89 ","pages":"Pages 536-587"},"PeriodicalIF":22.0000,"publicationDate":"2025-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Overcoming material limitations progresses of gallium oxide for power devices applications: A review\",\"authors\":\"Madani Labed , Chowdam Venkata Prasad , Ho Jung Jeon , Kyong Jae Kim , Jang Hyeok Park , Stephen Pearton , You Seung Rim\",\"doi\":\"10.1016/j.mattod.2025.08.007\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In recent years, gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) has garnered growing attention as a next-generation ultrawide bandgap (UWBG) semiconductor, owing to its exceptional material properties namely, its wide bandgap (∼4.8 eV), high breakdown electric field, and suitability for high-efficiency and high-voltage power electronic applications. This rising interest is reflected in the increasing volume of published research and the organization of dedicated international conferences. This comprehensive review provides an in-depth overview of the intrinsic properties of Ga<sub>2</sub>O<sub>3</sub> and highlights recent progress in material growth, device fabrication, and performance enhancement. Emphasis is placed on the critical challenges that currently impede the large-scale commercialization of Ga<sub>2</sub>O<sub>3</sub>-based devices. These include the longstanding difficulty in achieving stable p-type conductivity, the inherently low thermal conductivity, the presence of crystallographic defects such as nano- and micro-voids, the limitations of wet etching processes, and the high fabrication cost all of which collectively hinder device reliability and scalability. We also explore the latest strategies developed to address these challenges, including novel doping techniques to realize p-type behavior, thermal management solutions, defect passivation approaches, and innovations in selective etching and surface treatment. In addition, alloying strategies involving elements such as aluminum (Al) and iridium (Ir) are discussed for their potential to tune material properties, mitigate limitations, and enhance overall device performance. By consolidating recent advancements and addressing the remaining bottlenecks, this review aims to provide a comprehensive perspective on the state-of-the-art in Ga<sub>2</sub>O<sub>3</sub> research. It offers valuable insights for both academic researchers and industry professionals working toward the realization of commercially viable Ga<sub>2</sub>O<sub>3</sub>-based power electronic devices.</div></div>\",\"PeriodicalId\":387,\"journal\":{\"name\":\"Materials Today\",\"volume\":\"89 \",\"pages\":\"Pages 536-587\"},\"PeriodicalIF\":22.0000,\"publicationDate\":\"2025-08-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Today\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S136970212500344X\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Today","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S136970212500344X","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Overcoming material limitations progresses of gallium oxide for power devices applications: A review
In recent years, gallium oxide (Ga2O3) has garnered growing attention as a next-generation ultrawide bandgap (UWBG) semiconductor, owing to its exceptional material properties namely, its wide bandgap (∼4.8 eV), high breakdown electric field, and suitability for high-efficiency and high-voltage power electronic applications. This rising interest is reflected in the increasing volume of published research and the organization of dedicated international conferences. This comprehensive review provides an in-depth overview of the intrinsic properties of Ga2O3 and highlights recent progress in material growth, device fabrication, and performance enhancement. Emphasis is placed on the critical challenges that currently impede the large-scale commercialization of Ga2O3-based devices. These include the longstanding difficulty in achieving stable p-type conductivity, the inherently low thermal conductivity, the presence of crystallographic defects such as nano- and micro-voids, the limitations of wet etching processes, and the high fabrication cost all of which collectively hinder device reliability and scalability. We also explore the latest strategies developed to address these challenges, including novel doping techniques to realize p-type behavior, thermal management solutions, defect passivation approaches, and innovations in selective etching and surface treatment. In addition, alloying strategies involving elements such as aluminum (Al) and iridium (Ir) are discussed for their potential to tune material properties, mitigate limitations, and enhance overall device performance. By consolidating recent advancements and addressing the remaining bottlenecks, this review aims to provide a comprehensive perspective on the state-of-the-art in Ga2O3 research. It offers valuable insights for both academic researchers and industry professionals working toward the realization of commercially viable Ga2O3-based power electronic devices.
期刊介绍:
Materials Today is the leading journal in the Materials Today family, focusing on the latest and most impactful work in the materials science community. With a reputation for excellence in news and reviews, the journal has now expanded its coverage to include original research and aims to be at the forefront of the field.
We welcome comprehensive articles, short communications, and review articles from established leaders in the rapidly evolving fields of materials science and related disciplines. We strive to provide authors with rigorous peer review, fast publication, and maximum exposure for their work. While we only accept the most significant manuscripts, our speedy evaluation process ensures that there are no unnecessary publication delays.