WS2单分子膜中点缺陷相互作用的微观研究

IF 16 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-09-10 DOI:10.1021/acsnano.4c09204
Lisa Frammolino*, , , Madisen Holbrook, , , Chao Lei, , , Jeng-Yuan Tsai, , , Yi Wan, , , Lin-Yun Huang, , , Lain-Jong Li, , , Qimin Yan, , , Allan MacDonald, , and , Chih-Kang Shih*, 
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引用次数: 0

摘要

原子点缺陷为设计二维过渡金属二硫化物(TMDs)的性质和功能提供了另一种选择。在设计点缺陷以定制材料特性之前,对其电子结构的识别和研究是其在器件应用中实现的关键。单层WS2中最常见的两个原子点缺陷是硫空位和氧取代基,这两种原子点缺陷已被广泛报道,但它们之间的相互作用尚未被研究。在这里,我们报告了扫描隧道显微镜/光谱研究这两个共同点缺陷之间的相互作用。我们揭示了硫空位位(VS)上的占位隙态(OIGS)的出现,这是由它与局部氧取代基(OS)相互作用引起的。OIGS的能量位置是局部OS密度的强函数。通过从头计算,我们揭示了硫空位OIGS来源于钨d轨道和硫p轨道杂化的Γ -谷修饰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Microscopic Investigations of Point Defect Interactions in WS2 Monolayers

Microscopic Investigations of Point Defect Interactions in WS2 Monolayers

Microscopic Investigations of Point Defect Interactions in WS2 Monolayers

Atomic point defects provide an alternative tuning knob for engineering the properties and functionality of 2D transition metal dichalcogenides (TMDs). Prior to engineering point defects to tailor material properties, identification and investigation of their electronic structure is key to their implementation for device applications. The two most common atomic point defects in monolayer WS2 are sulfur vacancies and oxygen substituents, which have been thoroughly reported on, but their interaction has yet to be investigated. Here, we report a scanning tunneling microscopy/spectroscopy study of the interaction between these two common point defects. We reveal the appearance of an occupied in-gap state (OIGS) at the sulfur vacancy site, VS, resulting from its interaction with local oxygen substituents, OS. The energy location of the OIGS is a strong function of the local OS density. With the aid of ab initio calculations, we unveil that the sulfur vacancy OIGS originates from the Γ -valley modification of the tungsten d- and sulfur p-orbital hybridization.

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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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