低能离子溅射原子的能谱:计算机模拟

IF 0.4 Q4 PHYSICS, CONDENSED MATTER
V. I. Shulga
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引用次数: 0

摘要

计算了1 keV Ar离子轰击非晶靶(Si, Ti, Ni, V, Nb)后溅射原子的能谱和平均能量。使用计算机模拟程序OKSANA和SRIM-2013进行计算。结果表明,对于原子比入射离子重的靶,SRIM会大大高估快速溅射原子的贡献。这在计算表面结合能时尤其明显,通过调整计算的溅射产率与实验产率。仿真结果与基于溅射线性理论的溅射原子平均能量的解析估计进行了比较。结果发现,在所有考虑的情况下,这些估计也被大大高估了,因为它们没有考虑到低轰击能量下碰撞级联的退化。一个很好的协议的OKSANA, TRIM。SP和ACAT的模拟。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Energy Spectra of Atoms Sputtered by Low-Energy Ions: Computer Simulation

Energy Spectra of Atoms Sputtered by Low-Energy Ions: Computer Simulation

Energy Spectra of Atoms Sputtered by Low-Energy Ions: Computer Simulation

The energy spectra and average energies of sputtered atoms were calculated for a number of amorphous targets (Si, Ti, Ni, V, and Nb) bombarded with 1 keV Ar ions. The calculations were carried out using the computer simulation programs OKSANA and SRIM-2013. It was shown that for targets whose atoms are heavier than incident ions, SRIM can greatly overestimate the contribution of fast sputtered atoms. This is especially noticeable in calculations with the surface binding energy found by adjusting the calculated sputtering yields to the experimental ones. The simulation results are compared with analytical estimates of the average energy of ejected atoms based on the linear theory of sputtering. It was found that in all the cases considered, these estimates are also greatly overestimated, since they do not take into account the degradation of collision cascades at low bombarding energies. A good agreement of the OKSANA, TRIM.SP, and ACAT simulations is noted.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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