(001) Ni表面溅射的MD模型中溅射原子极性分布的形成特征

IF 0.4 Q4 PHYSICS, CONDENSED MATTER
A. I. Musin, V. N. Samoilov
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引用次数: 0

摘要

采用考虑离子表面入射的现代单晶溅射完整分子动力学模型,研究了能量为200 eV的氩离子在(001)Ni表面溅射形成原子极性和方位角分布的机理。结果表明,被方位角过聚焦的溅射原子只在与溅射原子相邻的表面平面上两个原子透镜中心方向对应的方向附近射出。结果表明,在87°±1.5°的方位角范围内,能量为2.5±0.1 eV的溅射原子在透镜中心附近的极角分布中,存在三个由发射机制明显不同的原子形成的极大值。结果表明,这些最大值的形成仅仅是由于单晶溅射的表面机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

On the Features of the Formation of Polar Distribution of Sputtered Atoms in the MD Model of the (001) Ni Face Sputtering

On the Features of the Formation of Polar Distribution of Sputtered Atoms in the MD Model of the (001) Ni Face Sputtering

On the Features of the Formation of Polar Distribution of Sputtered Atoms in the MD Model of the (001) Ni Face Sputtering

Using a modern complete molecular dynamics model of single crystal sputtering taking into account ion incidence on the surface, the mechanisms of formation of the polar and azimuthal angle distribution of atoms sputtered from the surface of the (001) Ni face by Ar ions with an energy of 200 eV are studied. It is shown that the sputtered atoms overfocused by the azimuthal angle eject only near the directions corresponding to the directions to the centers of lenses of two atoms in the surface plane neighboring to the ejecting atom. It is found that in the polar angular distribution of sputtered atoms with an energy of 2.5 ± 0.1 eV in the range of the azimuthal angle of 87° ± 1.5°, close to the center of the lens, three maxima formed by atoms with significantly different mechanisms of emission are observed. It is concluded that the formation of these maxima occurs only due to the surface mechanism of single crystal sputtering.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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